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Atmospheric Pressure Chemical Vapor Deposition of Functional Oxide Materials for Crystalline Silicon Solar Cells

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Date Issued:
2015
Abstract/Description:
Functional oxides are versatile materials that can simultaneously enable efficiency gains and cost reductions in crystalline silicon (c-Si) solar cells. In this work, the deposition of functional oxide materials using atmospheric pressure chemical vapor deposition (APCVD) and the integration of these materials into c-Si solar cells are explored. Specifically, thin oxide films and multi-layer film stacks are utilized for the following purposes: (1) to minimize front surface reflectance without increasing parasitic absorption within the anti-reflection coating(s); (2) to maximize internal back reflectance of rear passivated cells, thereby increasing optical absorption of weakly absorbed long wavelength photons (? (>) 900 nm); (3) to minimize recombination losses by providing excellent surface passivation; and (4) to improve doping processes during cell manufacturing (e.g., emitter and surface field formation) by functioning as highly controllable dopant sources compatible with in-line diffusion processes. The oxide materials deposited by APCVD include amorphous and polycrystalline titanium oxide, aluminum oxide, boron-doped aluminum oxide, silicon oxide, phosphosilicate glass, and borosilicate glass. The microstructure, optical properties, and electronic properties of these films are characterized for different deposition conditions. Additionally, the impact of these materials on the performance of different types of c-Si solar cells is presented using both simulated and experimental current-voltage curves.
Title: Atmospheric Pressure Chemical Vapor Deposition of Functional Oxide Materials for Crystalline Silicon Solar Cells.
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Name(s): Davis, Kristopher, Author
Schoenfeld, Winston, Committee Chair
Likamwa, Patrick, Committee Member
Moharam, Jim, Committee Member
Habermann, Dirk, Committee Member
University of Central Florida, Degree Grantor
Type of Resource: text
Date Issued: 2015
Publisher: University of Central Florida
Language(s): English
Abstract/Description: Functional oxides are versatile materials that can simultaneously enable efficiency gains and cost reductions in crystalline silicon (c-Si) solar cells. In this work, the deposition of functional oxide materials using atmospheric pressure chemical vapor deposition (APCVD) and the integration of these materials into c-Si solar cells are explored. Specifically, thin oxide films and multi-layer film stacks are utilized for the following purposes: (1) to minimize front surface reflectance without increasing parasitic absorption within the anti-reflection coating(s); (2) to maximize internal back reflectance of rear passivated cells, thereby increasing optical absorption of weakly absorbed long wavelength photons (? (>) 900 nm); (3) to minimize recombination losses by providing excellent surface passivation; and (4) to improve doping processes during cell manufacturing (e.g., emitter and surface field formation) by functioning as highly controllable dopant sources compatible with in-line diffusion processes. The oxide materials deposited by APCVD include amorphous and polycrystalline titanium oxide, aluminum oxide, boron-doped aluminum oxide, silicon oxide, phosphosilicate glass, and borosilicate glass. The microstructure, optical properties, and electronic properties of these films are characterized for different deposition conditions. Additionally, the impact of these materials on the performance of different types of c-Si solar cells is presented using both simulated and experimental current-voltage curves.
Identifier: CFE0005599 (IID), ucf:50267 (fedora)
Note(s): 2015-05-01
Ph.D.
Optics and Photonics, Optics and Photonics
Doctoral
This record was generated from author submitted information.
Subject(s): photovoltaics -- solar cells -- atmospheric pressure chemical vapor deposition -- functional oxide materials
Persistent Link to This Record: http://purl.flvc.org/ucf/fd/CFE0005599
Restrictions on Access: public 2015-05-15
Host Institution: UCF

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