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LDMOS Power Transistor Design and Evaluation using 2D and 3D Device Simulation
- Date Issued:
- 2017
- Abstract/Description:
- The benefit of the super-junction (SJ) technique and the use of a floating P layer for low voltage (30 V) laterally double-diffused metal oxide semiconductor (LDMOS) transistors are investigated in this thesis using Sentaurus TCAD simulation software. Optimizations to the SJ LDMOS were attempted such as adding a buffer layer to the device, but simulation and theoretical evidence point out that the benefits of the SJ technique are marginal at the 30 V application. A replacement for the SJ technique was sought, the floating P structure proved to be a good solution at the low voltage range due to its simpler cost effective process and performance gains achieved with optimization. A new idea of combining the floating P layer with shallow trench isolation is simulated yielding a low figure of merit (on state resistance (&)#215; gate charge) of 5.93 m?-nC.
Title: | LDMOS Power Transistor Design and Evaluation using 2D and 3D Device Simulation. |
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Name(s): |
Salih, Aiman, Author Yuan, Jiann-Shiun, Committee Chair Sundaram, Kalpathy, Committee Member Kapoor, Vikram, Committee Member University of Central Florida, Degree Grantor |
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Type of Resource: | text | |
Date Issued: | 2017 | |
Publisher: | University of Central Florida | |
Language(s): | English | |
Abstract/Description: | The benefit of the super-junction (SJ) technique and the use of a floating P layer for low voltage (30 V) laterally double-diffused metal oxide semiconductor (LDMOS) transistors are investigated in this thesis using Sentaurus TCAD simulation software. Optimizations to the SJ LDMOS were attempted such as adding a buffer layer to the device, but simulation and theoretical evidence point out that the benefits of the SJ technique are marginal at the 30 V application. A replacement for the SJ technique was sought, the floating P structure proved to be a good solution at the low voltage range due to its simpler cost effective process and performance gains achieved with optimization. A new idea of combining the floating P layer with shallow trench isolation is simulated yielding a low figure of merit (on state resistance (&)#215; gate charge) of 5.93 m?-nC. | |
Identifier: | CFE0006955 (IID), ucf:51673 (fedora) | |
Note(s): |
2017-05-01 M.S.E.E. Engineering and Computer Science, Electrical Engineering and Computer Engineering Masters This record was generated from author submitted information. |
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Subject(s): | Data center power efficiency improvement -- Electric vehicle power management -- LDMOS -- Power devices -- Low voltage device -- Super-junction -- TCAD simulation | |
Persistent Link to This Record: | http://purl.flvc.org/ucf/fd/CFE0006955 | |
Restrictions on Access: | campus 2018-11-15 | |
Host Institution: | UCF |