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- Title
- An uncooled mid-wave infrared detector based on optical response of laser-doped silicon carbide.
- Creator
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Lim, Geunsik, Kar, Aravinda, Coffey, Kevin, Vaidyanathan, Raj, Dhere, Neelkanth, Likamwa, Patrick, University of Central Florida
- Abstract / Description
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This dissertation focuses on an uncooled Mid-Wave Infra-Red (MWIR) detector was developed by doping an n-type 4H-SiC with Ga using the laser doping technique. 4H-SiC is one of the polytypes of crystalline silicon carbide, a wide bandgap semiconductor. The dopant creates an energy level of 0.30 eV, which was confirmed by optical spectroscopy of the doped sample. This energy level corresponds to the MWIR wavelength of 4.21 um. The detection mechanism is based on the photoexcitation of electrons...
Show moreThis dissertation focuses on an uncooled Mid-Wave Infra-Red (MWIR) detector was developed by doping an n-type 4H-SiC with Ga using the laser doping technique. 4H-SiC is one of the polytypes of crystalline silicon carbide, a wide bandgap semiconductor. The dopant creates an energy level of 0.30 eV, which was confirmed by optical spectroscopy of the doped sample. This energy level corresponds to the MWIR wavelength of 4.21 um. The detection mechanism is based on the photoexcitation of electrons by the photons of this wavelength absorbed in the semiconductor. This process modifies the electron density, which changes the refraction index and, therefore, the reflectance of the semiconductor is also changed. The change in the reflectance, which is the optical response of the detector, can be measured remotely with a laser beam such as a He-Ne laser. This capability of measuring the detector response remotely makes it a wireless optical detector. The variation of refraction index was calculated as a function of absorbed irradiance based on the reflectance data for the as-received and doped samples. A distinct change was observed for the refraction index of the doped sample, indicating that the detector is suitable for applications at 4.21 um wavelength. The Ga dopant energy level in the substrate was confirmed by optical absorption spectroscopy. Secondary ion mass spectroscopy (SIMS) of the doped samples revealed an enhancement in the solid solubility of Ga in the substrate when doping is carried out by increasing the number of laser scans. Higher dopant concentration increases the number of holes in the dopant energy level, enabling photoexcitation of more electrons from the valence band by the incident MWIR photons. The detector performance improves as the dopant concentration increases from 1.15(&)#215;1019 to 6.25(&)#215;10^20 cm^-3. The detectivity of the optical photodetector is found to be 1.07(&)#215;10^10 cm?Hz^1/2/W for the case of doping with 4 laser passes. The noise mechanisms in the probe laser, silicon carbide MWIR detector and laser power meter affect the performance of the detector such as the responsivity, noise equivalent temperature difference (NETD) and detectivity. For the MWIR wavelength 4.21 and 4.63 um, the experimental detectivity of the optical photodetector of this study is found to be 1.07(&)#215;10^10 cm?Hz^1/2/W, while the theoretical value is 2.39(&)#215;10^10 cm?Hz^1/2/W. The values of NETD are found to be 404.03 and 15.48 mK based on experimental data for an MWIR radiation source of temperature 25(&)deg;C and theoretical calculation respectively.The doped SiC also has a capability of gas detection since gas emission spectra are in infrared range. Similarly, the sensor is based on the semiconductor optics principle, i.e., an energy gap is created in a semiconductor by doping it with an appropriate dopant to ensure that the energy gap matches with an emission spectral line of the gas of interest. Specifically four sensors have been fabricated by laser doping four quadrants of a 6H-SiC substrate with Ga, Al, Sc and P atoms to detect CO2, NO, CO and NO2 gases respectively. The photons, which are emitted by the gas, excite the electrons in the doped sample and consequently change the electron density in various energy states. This phenomenon affects the refraction index of the semiconductor and, therefore, the reflectivity of the semiconductor is altered by the gas. The optical response of this semiconductor sensor is the reflected power of a probe beam, which is a He-Ne laser beam in this study. The CO2, NO, CO and NO2 gases change the refraction indices of Ga-, Al-, Sc- and Al-doped 6H-SiC, respectively, more prominently than the other gases tested in this study. Hence these doped 6H-SiC samples can be used as CO2, NO, CO and NO2 gas sensors respectively.
Show less - Date Issued
- 2014
- Identifier
- CFE0005519, ucf:50310
- Format
- Document (PDF)
- PURL
- http://purl.flvc.org/ucf/fd/CFE0005519
- Title
- LASER METALLIZATION AND DOPING FOR SILICON CARBIDE DIODE FABRICATION AND ENDOTAXY.
- Creator
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Tian, Zhaoxu, Kar, Aravinda, University of Central Florida
- Abstract / Description
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Silicon carbide is a promising semiconductor material for high voltage, high frequency and high temperature devices due to its wide bandgap, high breakdown electric field strength, highly saturated drift velocity of electrons and outstanding thermal conductivity. With the aim of overcoming some challenges in metallization and doping during the fabrication of silicon carbide devices, a novel laser-based process is provided to direct metallize the surface of silicon carbide without metal...
Show moreSilicon carbide is a promising semiconductor material for high voltage, high frequency and high temperature devices due to its wide bandgap, high breakdown electric field strength, highly saturated drift velocity of electrons and outstanding thermal conductivity. With the aim of overcoming some challenges in metallization and doping during the fabrication of silicon carbide devices, a novel laser-based process is provided to direct metallize the surface of silicon carbide without metal deposition and dope in silicon carbide without high temperature annealing, as an alternative to the conventional ion implantation, and find applications of this laser direct write metallization and doping technique on the fabrication of diodes, endotaxial layer and embedded optical structures on silicon carbide wafers. Mathematical models have been presented for the temperature distributions in the wafer during laser irradiation to optimize laser process parameters and understand the doping and metallization mechanisms in laser irradiation process. Laser irradiation of silicon carbide in a dopant-containing ambient allows to simultaneously heating the silicon carbide surface without melting and incorporating dopant atoms into the silicon carbide lattice. The process that dopant atoms diffuse into the bulk silicon carbide by laser-induced solid phase diffusion (LISPD) can be explained by considering the laser enhanced substitutional and interstitial diffusion mechanisms. Nitrogen and Trimethyaluminum (TMA) are used as dopants to produce n-type and p-type doped silicon carbide, respectively. Two laser doping methods, i.e., internal heating doping and surface heating doping are presented in this dissertation. Deep (800 nm doped junction for internal heating doping) and shallow (200 nm and 450 nm doped junction for surface heating doping) can be fabricated by different doping methods. Two distinct diffusion regions, near-surface and far-surface regions, were identified in the dopant concentration profiles, indicating different diffusion mechanisms in these two regions. The effective diffusion coefficients of nitrogen and aluminum were determined for both regions by fitting the diffusion equation to the measured concentration profiles. The calculated diffusivities are at least 6 orders of magnitude higher than the typical values for nitrogen and aluminum, which indicate that laser doping process enhances the diffusion of dopants in silicon carbide significantly. No amorphization was observed in laser-doped samples eliminating the need for high temperature annealing. Laser direct metallization can be realized on the surface of silicon carbide by generating metal-like conductive phases due to the decomposition of silicon carbide. The ohmic property of the laser direct metallized electrodes can be dramatically improved by fabricating such electrodes on laser heavily doped SiC substrate. This laser-induced solid phase diffusion technique has been utilized to fabricate endolayers in n-type 6H-SiC substrates by carbon incorporation. X-ray energy dispersive spectroscopic analysis shows that the thickness of endolayer is about 100 nm. High resolution transmission electron microscopic images indicate that the laser endotaxy process maintains the crystalline integrity of the substrate without any amorphization. Rutherford backscattering studies also show no amorphization and evident lattice disorder occur during this laser solid phase diffusion process. The resistivity of the endolayer formed in a 1.55 omega•cm silicon carbide wafer segment was found to be 1.1E5 omega•cm which is sufficient for device fabrication and isolation. Annealing at 1000 oC for 10 min to remove hydrogen resulted in a resistivity of 9.4E4 omega•cm. Prototype silicon carbide PIN diodes have been fabricated by doping the endolayer and parent silicon carbide epilayer with aluminum using this laser-induced solid phase diffusion technique to create p-regions on the top surfaces of the substrates. Laser direct metallized contacts were also fabricated on selected PIN diodes to show the effectiveness of these contacts. The results show that the PIN diode fabricated on a 30 nm thick endolayer can block 18 V, and the breakdown voltages and the forward voltages drop at 100 A/cm2 of the diodes fabricated on 4H-SiC with homoepilayer are 420 ~ 500 V and 12.5 ~ 20 V, respectively. The laser direct metallization and doping technique can also be used to synthesize embedded optical structures, which can increase 40% reflectivity compared to the parent wafer, showing potential for the creation of optical, electro-optical, opto-electrical, sensor devices and other integrated structures that are stable in high temperature, high-pressure, corrosive environments and deep space applications.
Show less - Date Issued
- 2006
- Identifier
- CFE0001061, ucf:46803
- Format
- Document (PDF)
- PURL
- http://purl.flvc.org/ucf/fd/CFE0001061
- Title
- Picosecond Yb-Doped Fiber Amplifier.
- Creator
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Zhu, Weibin, Amezcua Correa, Rodrigo, Schulzgen, Axel, Fathpour, Sasan, University of Central Florida
- Abstract / Description
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Due to its versatility, rare earth doped fiber amplifier (RDFA) has attracted a lot of researchers worldwide in recent years. Depends on different kinds of rare earth ion, RDFA can be categorized into neodymium doped fiber amplifier (NDFA), erbium doped fiber amplifier (EDFA), thulium doped fiber amplifier (TDFA), and so forth. Among many kinds of RDFA, the ytterbium doped fiber amplifier (YDFA) has received even more interest, especially in high power application, mainly because of its broad...
Show moreDue to its versatility, rare earth doped fiber amplifier (RDFA) has attracted a lot of researchers worldwide in recent years. Depends on different kinds of rare earth ion, RDFA can be categorized into neodymium doped fiber amplifier (NDFA), erbium doped fiber amplifier (EDFA), thulium doped fiber amplifier (TDFA), and so forth. Among many kinds of RDFA, the ytterbium doped fiber amplifier (YDFA) has received even more interest, especially in high power application, mainly because of its broad gain bandwidth and high conversion efficiency which are due to its relatively simple electronic structure.The purpose of this research is to study the YDFA by developing a model and building a YDFA setup in free space configuration. The active fiber used in the setup is a few modes, polarization-maintaining double-cladding ytterbium-doped large mode area (LMA) fiber and the length is 1m. The pump used is a tunable 975nm laser diode and a 1064nm laser diode was used as the seed which has 630 ps pulse duration time and 9.59 kHz repetition rate. This setup produces 2.514W average power, corresponding to a pulse peak power of 423kW, with 15W absorbed pump power. The spectrum of the output power has also been investigated.
Show less - Date Issued
- 2017
- Identifier
- CFE0006678, ucf:51214
- Format
- Document (PDF)
- PURL
- http://purl.flvc.org/ucf/fd/CFE0006678
- Title
- LASER ENHANCED DOPING FOR SILICON CARBIDE WHITE LIGHTEMITTING DIODES.
- Creator
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Bet, Sachin, Kar, Aravinda, University of Central Florida
- Abstract / Description
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This work establishes a solid foundation for the use of indirect band gap semiconductors for light emitting application and presents the work on development of white light emitting diodes (LEDs) in silicon carbide (SiC). Novel laser doping has been utilized to fabricate white light emitting diodes in 6H-SiC (n-type N) and 4H-SiC (p-type Al) wafers. The emission of different colors to ultimately generate white light is tailored on the basis of donor acceptor pair (DAP) recombination mechanism...
Show moreThis work establishes a solid foundation for the use of indirect band gap semiconductors for light emitting application and presents the work on development of white light emitting diodes (LEDs) in silicon carbide (SiC). Novel laser doping has been utilized to fabricate white light emitting diodes in 6H-SiC (n-type N) and 4H-SiC (p-type Al) wafers. The emission of different colors to ultimately generate white light is tailored on the basis of donor acceptor pair (DAP) recombination mechanism for luminescence. A Q-switched Nd:YAG pulse laser (1064 nm wavelength) was used to carry out the doping experiments. The p and n regions of the white SiC LED were fabricated by laser doping an n-type 6H-SiC and p-type 4H-SiC wafer substrates with respective dopants. Cr, B and Al were used as p-type dopants (acceptors) while N and Se were used as n-type dopants (donors). Deep and shallow donor and acceptor impurity level states formed by these dopants tailor the color properties for pure white light emission. The electromagnetic field of lasers and non-equilibrium doping conditions enable laser doping of SiC with increased dopant diffusivity and enhanced solid solubility. A thermal model is utilized to determine the laser doping parameters for temperature distribution at various depths of the wafer and a diffusion model is presented including the effects of Fick's diffusion, laser electromagnetic field and thermal stresses due to localized laser heating on the mass flux of dopant atoms. The dopant diffusivity is calculated as a function of temperature at different depths of the wafer based on measured dopant concentration profile. The maximum diffusivities achieved in this study are 4.6110-10 cm2/s at 2898 K and 6.9210-12 cm2/s at 3046 K for Cr in 6H-SiC and 4H-SiC respectively. Secondary ion mass spectrometric (SIMS) analysis showed the concentration profile of Cr in SiC having a penetration depth ranging from 80 nm in p-type 4H-SiC to 1.5 m in n-type 6H-SiC substrates respectively. The SIMS data revealed enhanced solid solubility (2.291019 cm-3 in 6H-SiC and 1.421919 cm-3 in 4H-SiC) beyond the equilibrium limit (31017 cm-3 in 6H-SiC above 2500 C) for Cr in SiC. It also revealed similar effects for Al and N. The roughness, surface chemistry and crystalline integrity of the doped sample were examined by optical interferometer, energy dispersive X-ray spectrometry (EDS) and transmission electron microscopy (TEM) respectively. Inspite of the larger atomic size of Cr compared to Si and C, the non-equilibrium conditions during laser doping allow effective incorporation of dopant atoms into the SiC lattice without causing any damage to the surface or crystal lattice. Deep Level Transient Spectroscopy (DLTS) confirmed the deep level acceptor state of Cr with activation energies of Ev+0.80 eV in 4H-SiC and Ev+0.45 eV in 6H-SiC. The Hall Effect measurements showed the hole concentration to be 1.981019 cm-3 which is almost twice the average Cr concentration (11019 cm-3) obtained from the SIMS data. These data confirmed that almost all of the Cr atoms were completely activated to the double acceptor state by the laser doping process without requiring any subsequent annealing step. Electroluminescence studies showed blue (460-498 nm), blue-green (500-520 nm) green (521-575 nm), and orange (650-690 nm) wavelengths due to radiative recombination transitions between donor-acceptors pairs of N-Al, N-B, N-Cr and Cr-Al respectively, while a prominent violet (408 nm) wavelength was observed due to transitions from the nitrogen level to the valence band level. The red (698-738 nm) luminescence was mainly due to metastable mid-bandgap states, however under high injection current it was due to the quantum mechanical phenomenon pertaining to band broadening and overlapping. This RGB combination produced a broadband white light spectrum extending from 380 to 900 nm. The color space tri-stimulus values for 4H-SiC doped with Cr and N were X = 0.3322, Y = 0.3320 and Z = 0.3358 as per 1931 CIE (International Commission on Illumination) corresponding to a color rendering index of 96.56 and the color temperature of 5510 K. And for 6H-SiC n-type doped with Cr and Al, the color space tri-stimulus values are X = 0.3322, Y = 0.3320 and Z = 0.3358. The CCT was 5338 K, which is very close to the incandescent lamp (or black body) and lies between bright midday sun (5200 K) and average daylight (5500 K) while CRI was 98.32. Similar white LED's were also fabricated using Cr, Al, Se as one set of dopants and B, Al, N as another.
Show less - Date Issued
- 2008
- Identifier
- CFE0002362, ucf:47808
- Format
- Document (PDF)
- PURL
- http://purl.flvc.org/ucf/fd/CFE0002362
- Title
- MONTE CARLO SIMULATION OF HOLE TRANSPORT AND TERAHERTZ AMPLIFICATION IN MULTILAYER DELTA DOPED SEMICONDUCTOR STRUCTURES.
- Creator
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Dolguikh, Maxim, Peale, Robert, University of Central Florida
- Abstract / Description
-
Monte Carlo method for the simulation of hole dynamics in degenerate valence subbands of cubic semiconductors is developed. All possible intra- and inter-subband scattering rates are theoretically calculated for Ge, Si, and GaAs. A far-infrared laser concept based on intersubband transitions of holes in p-type periodically delta-doped semiconductor films is studied using numerical Monte-Carlo simulation of hot hole dynamics. The considered device consists of monocrystalline pure Ge layers...
Show moreMonte Carlo method for the simulation of hole dynamics in degenerate valence subbands of cubic semiconductors is developed. All possible intra- and inter-subband scattering rates are theoretically calculated for Ge, Si, and GaAs. A far-infrared laser concept based on intersubband transitions of holes in p-type periodically delta-doped semiconductor films is studied using numerical Monte-Carlo simulation of hot hole dynamics. The considered device consists of monocrystalline pure Ge layers periodically interleaved with delta-doped layers and operates with vertical or in-plane hole transport in the presence of a perpendicular in-plane magnetic field. Inversion population on intersubband transitions arises due to light hole accumulation in E B fields, as in the bulk p-Ge laser. However, the considered structure achieves spatial separation of hole accumulation regions from the doped layers, which reduces ionized-impurity and carrier-carrier scattering for the majority of light holes. This allows remarkable increase of the gain in comparison with bulk p-Ge lasers. Population inversion and gain sufficient for laser operation are expected up to 77 K. Test structures grown by chemical vapor deposition demonstrate feasibility of producing the device with sufficient active thickness to allow quasioptical electrodynamic cavity solutions. The same device structure is considered in GaAs. The case of Si is much more complicated due to strong anisotropy of the valence band. The primary new result for Si is the first consideration of the anisotropy of optical phonon scattering for hot holes.
Show less - Date Issued
- 2005
- Identifier
- CFE0000863, ucf:46672
- Format
- Document (PDF)
- PURL
- http://purl.flvc.org/ucf/fd/CFE0000863
