Current Search: diffusion length (x)
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- Title
- INFLUENCE OF ELECTRON TRAPPING ON MINORITY CARRIER TRANSPORT PROPERTIES OF WIDE BAND GAP SEMICONDUCTORS.
- Creator
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Tirpak, Olena, Chernyak, Leonid, University of Central Florida
- Abstract / Description
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Minority carrier transport properties and the effects of electron irradiation/injection were studied in GaN and ZnO containing dopants known to form acceptor states deep within the materials' bandgap. Minority carrier diffusion length and lifetime changes were investigated using Electron Beam Induced Current (EBIC) method, cathodoluminescence spectroscopy, spectral photoresponse and persistent photoconductivity measurements. It is shown that electron irradiation by the beam of a scanning...
Show moreMinority carrier transport properties and the effects of electron irradiation/injection were studied in GaN and ZnO containing dopants known to form acceptor states deep within the materials' bandgap. Minority carrier diffusion length and lifetime changes were investigated using Electron Beam Induced Current (EBIC) method, cathodoluminescence spectroscopy, spectral photoresponse and persistent photoconductivity measurements. It is shown that electron irradiation by the beam of a scanning electron microscope results in a significant increase of minority carrier diffusion length. These findings are supported by the cathodoluminescence measurements that demonstrate the decay of near-band-edge intensity as a consequence of increasing carrier lifetime under continuous irradiation by the electron beam. Temperature-dependent measurements were used to determine the activation energies for the electron irradiation-induced effects. The latter energies were found to be consistent with the involvement of deep acceptor states. Based on these findings, the effects of electron irradiation are explained via the mechanism involving carrier trapping on these levels. Solid-state electron injection was also shown to result in a similar increase of minority carrier lifetime and diffusion length. Solid-state injection was carried out by applying the forward bias to a ZnO homojunction and resulted in a significant improvement of the peak photoresponse of the junction. This improvement was unambiguously correlated with the increase of the minority carrier diffusion length due to electron injection.
Show less - Date Issued
- 2007
- Identifier
- CFE0001710, ucf:47325
- Format
- Document (PDF)
- PURL
- http://purl.flvc.org/ucf/fd/CFE0001710
- Title
- Impact of Ionizing Radiation and Electron Injection on Carrier Transport Properties in Narrow and Wide Bandgap Semiconductors.
- Creator
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Lee, Jonathan, Flitsiyan, Elena, Chernyak, Leonid, Peale, Robert, Orlovskaya, Nina, University of Central Florida
- Abstract / Description
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This study investigated the minority carrier properties of wide and narrow bandgap semiconductors. Included specifically are wide bandgap materials GaN and ?-Ga2O3, and narrow bandgap InAs/GaSb type-II strain-layer superlattice. The importance of minority carrier behavior in bipolar device performance is utmost because it is the limiting component in current conduction. The techniques used to determine minority carrier properties include electron beam induced current (EBIC) and...
Show moreThis study investigated the minority carrier properties of wide and narrow bandgap semiconductors. Included specifically are wide bandgap materials GaN and ?-Ga2O3, and narrow bandgap InAs/GaSb type-II strain-layer superlattice. The importance of minority carrier behavior in bipolar device performance is utmost because it is the limiting component in current conduction. The techniques used to determine minority carrier properties include electron beam induced current (EBIC) and cathodoluminescence (CL) spectroscopy. The CL spectroscopy is complemented with time-resolved CL (TRCL) for direct measurement of carrier radiative recombination lifetime. The minority carrier properties and effect of high energy radiation is explored. The GaN TRCL results suggested an activation energy effecting carrier lifetime of about 90 meV which is related to nitrogen vacancies. The effects of 60Co gamma radiation are demonstrated and related to the effects of electron injection in GaN-based devices. The effects of various high energy radiations upon Si-doped ?-Ga2O3 minority carrier diffusion length and radiative lifetime are measured. The non-irradiated sample thermal activation energies found for minority carrier diffusion length were 40.9 meV, related to shallow Si-donors in the material. The CL results demonstrate that the bandgap of 4.9 eV is slightly indirect. The thermal activation energy decreased on 1.5 MeV electron irradiation but increased for 10 MeV proton irradiation. The increase in energy was related to higher order defects and their complexes, and influenced recombination lifetime significantly. Finally, the diffusion length is reported for narrow bandgap InAs/GaSb superlattice structure and the effect of 60Co gamma radiation is demonstrated.In general, the defects introduced by high energy radiations decreased minority carrier diffusion length, except for 60Co gamma on AlGaN/GaN HEMT devices and high-temperature proton irradiated ?-Ga2O3.
Show less - Date Issued
- 2018
- Identifier
- CFE0007217, ucf:52239
- Format
- Document (PDF)
- PURL
- http://purl.flvc.org/ucf/fd/CFE0007217
- Title
- ELECTRON INJECTION-INDUCED EFFECTS IN III-NITRIDES: PHYSICS AND APPLICATIONS.
- Creator
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Burdett, William Charles, Chernyak, Leonid, University of Central Florida
- Abstract / Description
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This research investigated the effect of electron injection in III-Nitrides. The combination of electron beam induced current and cathodoluminescence measurements was used to understand the impact of electron injection on the minority carrier transport and optical properties. In addition, the application of the electron injection effect in optoelectronic devices was investigated.The impact of electron injection on the minority carrier diffusion length was studied at various temperatures in Mg...
Show moreThis research investigated the effect of electron injection in III-Nitrides. The combination of electron beam induced current and cathodoluminescence measurements was used to understand the impact of electron injection on the minority carrier transport and optical properties. In addition, the application of the electron injection effect in optoelectronic devices was investigated.The impact of electron injection on the minority carrier diffusion length was studied at various temperatures in Mg-doped p-GaN, p-AlxGa1-xN, and p-AlxGa1-x N/GaN superlattices. It was found that the minority carrier diffusion length experienced a multi-fold linear increase and that the rate of change of the diffusion length decreased exponentially with increasing temperature. The effect was attributed to a temperature-activated release of the electrons, which were trapped by the Mg levels.The activation energies for the electron injection effect in the Mg-doped (Al)GaN samples were found to range from 178 to 267 meV, which is close to the thermal ionization energy of the Mg acceptor. The activation energy observed for Al0.15Ga0.85N and Al0.2Ga0.8N was consistent with the deepening of the Mg acceptor level due to the incorporation of Al into the GaN lattice. The activation energy in the homogeneously doped Al0.2Ga0.8N/GaN superlattice indicates that the main contribution to the electron injection effect comes from the capture of injected electrons by the wells (GaN). The electron injection effect was successfully applied to GaN doped with an impurity (Mn) other than Mg. Electron injection into Mn-doped GaN resulted in a multi-fold increase of the minority carrier diffusion length and a pronounced decrease in the band-to-band cathodoluminescence intensity. The activation energy due to the electron injection effect was estimated from temperature-dependent cathodoluminescence measurements to be 360 meV. The decrease in the band-to-band cathodoluminescence is consistent with an increase in the diffusion length and these results are attributed to an increase in the minority carrier lifetime due to the trapping of injected electrons by the Mn levels.A forward bias was applied to inject electrons into commercially built p-i-n and Schottky barrier photodetectors. Up to an order of magnitude increase in the peak (360 nm) responsivity was observed. The enhanced photoresponse lasted for over four weeks and was attributed to an electron injection-induced increase of the minority carrier diffsuion length and the lifetime.
Show less - Date Issued
- 2004
- Identifier
- CFE0000080, ucf:46109
- Format
- Document (PDF)
- PURL
- http://purl.flvc.org/ucf/fd/CFE0000080