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Far-infrared bands in plasmonic metal-insulator-metal absorbers optimized for long wave infrared
| Title: | Far-infrared bands in plasmonic metal-insulator-metal absorbers optimized for long wave infrared. |
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| Name(s): |
Evans, Rachel, Author Peale, Robert, Committee Chair Ishigami, Masahiro, Committee Member Lyakh, Arkadiy, Committee Member University of Central Florida, Degree Grantor |
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| Type of Resource: | text | |
| Date Issued: | 2018 | |
| Publisher: | University of Central Florida | |
| Language(s): | English | |
| Abstract/Description: | Metal(-)insulator(-)metal (MIM) resonant absorbers comprise a conducting ground plane, a thin dielectric, and thin separated metal top-surface structures. Long-wave infrared (LWIR) fundamental absorptions are experimentally shown to be optimized for a ratio of dielectric thickness to top-structure dimension t/l (>) 0.08. The fundamental resonance wavelength is predicted by different analytic standing-wave theories to be ~2nl, where n is the dielectric refractive index. Thus, for the dielectrics SiO2, AlN, and TiO2, l values of a few microns give fundamentals in the 8-12 micron LWIR wavelength region. Agreement of observed fundamental resonance wavelength with theory is better for t/l (>) ~0.2. Harmonics at shorter wavelengths are always observed, but we show that there are additional resonances in the far-infrared 20-50 micron wavelength range, well beyond the predicted fundamental. These appear to be due to dispersion. They may impact selectivity in spectral sensing applications. | |
| Identifier: | CFE0007176 (IID), ucf:52267 (fedora) | |
| Note(s): |
2018-08-01 M.S. Sciences, Physics Masters This record was generated from author submitted information. |
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| Subject(s): | Plasmonics -- infrared -- far-infrared -- THz -- absorber | |
| Persistent Link to This Record: | http://purl.flvc.org/ucf/fd/CFE0007176 | |
| Restrictions on Access: | public 2018-08-15 | |
| Host Institution: | UCF |
