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- Title
- DEBRIS CHARACTERIZATION AND MITIGATION OF DROPLET LASER PLASMA SOURCES FOR EUV LITHOGRAPHY.
- Creator
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Takenoshita, Kazutoshi, Richardson, Martin, University of Central Florida
- Abstract / Description
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Extreme ultraviolet lithography (EUVL) is a next generation lithographic techniques under development for fabricating semiconductor devices with feature sizes smaller than 32 nm. The optics to be used in the EUVL steppers is reflective optics with multilayer mirror coatings on each surface. The wavelength of choice is 13.5 nm determined by the optimum reflectivity of the mirror coatings. The light source required for this wavelength is derived from a hot-dense plasma produced by either a gas...
Show moreExtreme ultraviolet lithography (EUVL) is a next generation lithographic techniques under development for fabricating semiconductor devices with feature sizes smaller than 32 nm. The optics to be used in the EUVL steppers is reflective optics with multilayer mirror coatings on each surface. The wavelength of choice is 13.5 nm determined by the optimum reflectivity of the mirror coatings. The light source required for this wavelength is derived from a hot-dense plasma produced by either a gas discharge or a laser. This study concentrate only on the laser produced plasma source because of its advantages of scalability to higher repetition rates. The design of a the laser plasma EUVL light source consists of a plasma produced from a high-intensity focused laser beam from a solid/liquid target, from which radiation is generated and collected by a large solid angle mirror or array of mirrors. The collector mirrors have the same reflectivity characteristics as the stepper mirrors. The EUVL light source is considered as the combination of both the hot-dense plasma and the collector mirrors. The EUVL light sources required by the stepper manufacturers must have sufficient EUV output power and long operational lifetimes to meet market-determined chip production rates. The most influential factor in achieving the required EUV output power is the conversion efficiency (CE) of laser input energy relative to the EUV radiation collected. A high CE is demonstrated in a separate research program by colleagues in the Laser Plasma laboratory at CREOL. Another important factor for the light source is the reflectivity lifetime of the collection optics as mirror reflectivity can be degraded by deposition and ablation from the plasma debris. Realization of a high CE but low debris plasma source is possible by reducing the mass of the target, which is accomplished by using tin-doped droplet targets. These have sufficient numbers of tin atoms for high CE, but the debris generation is minimal. The first part of this study investigates debris emissions from tin-doped droplet targets, in terms of aerosols and ions. Numerous tin aerosols can be created during a single laser-target interaction. The effects these interactions are observed and the depositions are investigated using SEM, AFM, AES, XPS, and RBS techniques. The generation of aerosols is found to be the result of incomplete ionization of the target material, corresponding to non-optimal laser coupling to the target for maximum CE. In order to determine the threats of the ion emission to the collector mirror coatings from an optimal, fully ionized target, the ion flux is measured at the mirror distance using various techniques. The ion kinetic energy distributions obtained for individual ion species are quantitatively analyzed. Incorporating these distributions with Monte-Carlo simulations provide lifetime estimation of the collector mirror under the effect of ion sputtering. The current estimated lifetime the tin-doped droplet plasma source is only a factor of 500 less than the stepper manufacturer requirements, without the use of any mitigation schemes to stop these ions interacting with the mirror. The second part of this investigation explores debris mitigation schemes. Two mitigation schemes are applied to tin-doped droplet laser plasmas; electrostatic field mitigation, and a combination of a foil trap with a magnetic field. Both mitigation schemes demonstrate their effectiveness in suppressing aerosols and ion flux. A very small number of high-energy ions still pass through the combination of the two mitigation schemes but the sputtering caused by these ions is too small to offer a threat to mirror lifetime. It is estimated that the lifetime of the collector mirror, and hence the source lifetime, will be sufficient when tin-doped targets are used in combination with these mitigation schemes.
Show less - Date Issued
- 2006
- Identifier
- CFE0001289, ucf:46920
- Format
- Document (PDF)
- PURL
- http://purl.flvc.org/ucf/fd/CFE0001289
- Title
- TOWARDS DIRECT WRITING OF 3-D PHOTONIC CIRCUITS USING ULTRAFAST LASERS.
- Creator
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Zoubir, Arnaud, Richardson, Martin, University of Central Florida
- Abstract / Description
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The advent of ultrafast lasers has enabled micromachining schemes that cannot be achieved by other current techniques. Laser direct writing has emerged as one of the possible routes for fabrication of optical waveguides in transparent materials. In this thesis, the advantages and limitations of this technique are explored. Two extended-cavity ultrafast lasers were built and characterized as the laser sources for this study, with improved performance over existing systems. Waveguides are...
Show moreThe advent of ultrafast lasers has enabled micromachining schemes that cannot be achieved by other current techniques. Laser direct writing has emerged as one of the possible routes for fabrication of optical waveguides in transparent materials. In this thesis, the advantages and limitations of this technique are explored. Two extended-cavity ultrafast lasers were built and characterized as the laser sources for this study, with improved performance over existing systems. Waveguides are fabricated in oxide glass, chalcogenide glass, and polymers, these being the three major classes of materials for the telecommunication industry. Standard waveguide metrology is performed on the fabricated waveguides, including refractive index profiling and mode analysis. Furthermore, a finite-difference beam propagation method for wave propagation in 3D-waveguides is proposed. The photo-structural modifications underlying the changes in the material optical properties after exposure are investigated. The highly nonlinear processes of the light/matter interaction during the writing process are described using a free electron model. UV/visible absorption spectroscopy, photoluminescence spectroscopy and Raman spectroscopy are used to assess the changes occurring at the atomic level. Finally, the impact of laser direct writing on nonlinear waveguide applications is discussed.
Show less - Date Issued
- 2004
- Identifier
- CFE0000236, ucf:46252
- Format
- Document (PDF)
- PURL
- http://purl.flvc.org/ucf/fd/CFE0000236
- Title
- HIGH-INTENSITY ULTRA-FAST LASER INTERACTION TECHNOLOGIES.
- Creator
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Bernath, Robert, Richardson, Martin, University of Central Florida
- Abstract / Description
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To our knowledge this is the first comprehensive study of laser-induced effects generated at intermediate distances using self-channeled femtosecond laser pulses. Studies performed were made both experimentally and theoretically with the use of novel modeling techniques. Peak laser pulse powers above 3 GW allow beam propagation without divergence for up to several kilometers. In this regime, experiments were performed at 30 meters from the laser system in a custom propagation and target range...
Show moreTo our knowledge this is the first comprehensive study of laser-induced effects generated at intermediate distances using self-channeled femtosecond laser pulses. Studies performed were made both experimentally and theoretically with the use of novel modeling techniques. Peak laser pulse powers above 3 GW allow beam propagation without divergence for up to several kilometers. In this regime, experiments were performed at 30 meters from the laser system in a custom propagation and target range, utilizing the Laser Plasma Laboratory's Terawatt laser system. Experiments included investigations of laser ablation; electromagnetic pulsed (EMP) radiation generation over the 1-18 GHz region; shockwave formation in air and solid media; optical coupling of channeled pulses into transparent media; and, conservation of energy in these interactions. The use of bursts of femtosecond pulses was found to increase the ablation rate significantly over single-pulse ablation in both air and vacuum. EMP generation from near-field focused and distance-propagated pulses was investigated. Field strengths upwards of 400 V/m/λ for vacuum focusing and 25 V/m/λ for self-channeled pulses were observed. The total field strengths over 1-18 GHz measured at distance surpassed 12 kV/m. Shockwaves generated in transparent media at 30 meters were observed as a function of time. It was found that the interaction conditions control the formation and propagation of the shock fronts into the medium. Due to the processes involved in self-channeling, significant fractions of the laser pulse were coupled into the target materials, resulting in internal optical and exit-surface damage. Basic estimations on the conservation of energy in the interaction are presented. The results of the experiments are supported by hydrodynamic plasma physics code and acoustic modeling.
Show less - Date Issued
- 2007
- Identifier
- CFE0001902, ucf:47497
- Format
- Document (PDF)
- PURL
- http://purl.flvc.org/ucf/fd/CFE0001902
- Title
- CONTROL AND STABILIZATION OF LASER PLASMASOURCES FOR EUV LITHOGRAPHY.
- Creator
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Cunado, Jose, Richardson, Martin, University of Central Florida
- Abstract / Description
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Extreme Ultraviolet (EUV) sources rely on droplet laser plasmas for EUV generation. These sources consist of a small (30 μm diameter) droplet which is excited into plasma emitting EUV around 13.5 nm, the industry's chosen wavelength for EUV lithography (EUVL). These sources are the best candidates for the commercialization of EUVL allowing mass production of computer chips with 32 nm or even smaller feature size. However, the biggest challenges which EUV source developers encounter...
Show moreExtreme Ultraviolet (EUV) sources rely on droplet laser plasmas for EUV generation. These sources consist of a small (30 μm diameter) droplet which is excited into plasma emitting EUV around 13.5 nm, the industry's chosen wavelength for EUV lithography (EUVL). These sources are the best candidates for the commercialization of EUVL allowing mass production of computer chips with 32 nm or even smaller feature size. However, the biggest challenges which EUV source developers encounter today are the issues of conversion efficiency (CE) and debris.In order to satisfy the technology requirements, the source will need to meet high levels of stability, performance, and lifetime. Our tin-doped droplet plasma has demonstrated high CE and low debris resulting in long lifetime. Long term stability is obtained through the use of novel tracking techniques and active feedback. The laser plasma targeting system combines optical illumination and imaging, droplet technology innovation, advanced electronics, and custom software which act in harmony to provide complete stabilization of the droplets. Thus, a stable, debris-free light source combined with suitable collection optics can provide useful EUV radiation power. Detailed description of the targeting system and the evaluation of the system will be presented.
Show less - Date Issued
- 2007
- Identifier
- CFE0001790, ucf:47278
- Format
- Document (PDF)
- PURL
- http://purl.flvc.org/ucf/fd/CFE0001790
- Title
- SPECTROSCOPIC STUDIES OF LASER PLASMAS FOR EUV SOURCES.
- Creator
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George, Simi, Richardson, Martin, University of Central Florida
- Abstract / Description
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With the availability of high reflectivity multilayer mirrors and zone plate lenses, the EUV region (5nm - 40nm) of the electromagnetic spectrum is currently being explored for applications of nanoscale printing and imaging. Advances made in this area have consequences for many areas of science. Research for producing a compact, bright EUV source for laboratory use has gained momentum in recent years. For this study, EUV radiation is produced by irradiating target materials using a focused...
Show moreWith the availability of high reflectivity multilayer mirrors and zone plate lenses, the EUV region (5nm - 40nm) of the electromagnetic spectrum is currently being explored for applications of nanoscale printing and imaging. Advances made in this area have consequences for many areas of science. Research for producing a compact, bright EUV source for laboratory use has gained momentum in recent years. For this study, EUV radiation is produced by irradiating target materials using a focused laser beam. Focused laser beam ionizes the target to create a hot, dense, pulsed plasma source, where emission is a result of the relaxation of excited levels. Spectroscopy is used as the main diagnostic to obtain the spectral signature of the plasma. Spectral characteristics are used to deduce the physical state of plasma, thus enabling the tuning of laser irradiance conditions to maximize the needed emission bandwidth. Various target materials are studied, as well as different target geometries, with spectroscopy below 200 nm on pulsed micro-plasmas being a particularly daunting task. Total range spectroscopy from 1 nm to greater than 1 micron is completed for tin-doped spherical droplet plasma source. Reliable plasma diagnostics require both accurate measurements and solid theoretical support in order to interpret the experimental results. Using existing 1D-hydrocode, temperature and density characteristics of the expanding plasma is simulated for any set of experimental conditions. Existing atomic codes written for calculating one-electron radial wavefunctions with LS-coupling scheme via Hartree-Fock method is used in order to gain details of the ion stages, populations, transitions, etc, contributing to the spectral data.
Show less - Date Issued
- 2007
- Identifier
- CFE0001972, ucf:47433
- Format
- Document (PDF)
- PURL
- http://purl.flvc.org/ucf/fd/CFE0001972
- Title
- MEASUREMENT AND CHARACTERIZATION OF MICROWAVE TRANSIENT ELECTROMAGNETIC FIELDS GENERATED FROM LASER/MATTER INTERACTION.
- Creator
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Barbieri, Nicholas, Richardson, Martin, University of Central Florida
- Abstract / Description
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From past experiments conducted with high intensity lasers, it has been known for some time that laser matter interactions result in the emission of short, transient electromagnetic pulses. Previous investigations into laser generated electromagnetic pulses provide basic information regarding frequencies where such pulses may be present, along with the time duration of the pulses. Such investigations have also demonstrated a number of measurement techniques in which basic information on the...
Show moreFrom past experiments conducted with high intensity lasers, it has been known for some time that laser matter interactions result in the emission of short, transient electromagnetic pulses. Previous investigations into laser generated electromagnetic pulses provide basic information regarding frequencies where such pulses may be present, along with the time duration of the pulses. Such investigations have also demonstrated a number of measurement techniques in which basic information on the pulses may be obtained. The purpose of this current investigation is to obtain a more thorough description and understands of electromagnetic pulses generated for laser matter interaction. To this end, spatial radiation patterns emanating from various laser excited matter sources was predicted using antenna theory for far field radiators. Experimentally, it is the intention of this investigation to gather comprehensive time and frequency domain data on laser matter generated electromagnetic pulses using a number of specific laser targets. Radiation detection techniques using broadband, calibrated EMC horn antennas were devised. A unique measurement system known as an inverse superhetereodyne receiver was designed, tested and demonstrated. An experimental setup using such instrumentation was established. Using the above instrumentation and experimental setup should yield comprehensive time and frequency domain data over a spectra range of 1-40 GHz and with a time resolution of 50 ps. Because the experimental system employed is calibrated, measurements can be corresponded to incident electromagnetic fields. Several tests were conducted to ensure the proper operation of experimental apparatus. A modulation test was conducted on the inverse superhetereodyne receiver to ensure that the experimentally observed signals appeared when and where predicted within the receiver's bandwidth. The experimental setup was used to measure radiation emitted from an electrostatic discharge source of known distance and discharge voltage. Frequency domain data from the discharges were collected and compiled using a Matlab application ultimately intended to measure laser matter interaction generated electromagnetic pulses, resulting in a compiled frequency domain description comprising 1-17 GHz. The inverse Fourier transform was used to retrieve the time domain response from the compiled data. The discharge gaps characteristics where systematically altered as to allow a parametric study of the compiled data. The discharge measurements demonstrate the measurement system's ability to analyze unknown, short duration; broadband microwave signals.
Show less - Date Issued
- 2005
- Identifier
- CFE0000879, ucf:46646
- Format
- Document (PDF)
- PURL
- http://purl.flvc.org/ucf/fd/CFE0000879
- Title
- RADIATION STUDIES OF THE TIN-DOPED MICROSCOPIC DROPLET LASER PLASMA LIGHT SOURCE SPECIFIC TO EUV LITHOGRAPHY.
- Creator
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Koay, Chiew-Seng, Richardson, Martin, University of Central Florida
- Abstract / Description
-
Extreme ultraviolet lithography(EUVL) is being developed worldwide as the next generation technology to be inserted in ~ 2009 for the mass production of IC chips with feature sizes
Show moreExtreme ultraviolet lithography(EUVL) is being developed worldwide as the next generation technology to be inserted in ~ 2009 for the mass production of IC chips with feature sizes <35 nm. One major challenge to its implementation is the development of a 13.5 nm EUV source of radiation that meets the requirements of current roadmap designs of the source of illumination in commercial EUVL scanners. The light source must be debris-free, in a free-space environment with the imaging EUV optics that must provide sufficient, narrow spectral band EUV power to print 100 wafers/hr. To meet this need, extensive studies on emission from a laser plasma source utilizing tin-doped droplet target was conducted. Presented in this work, are the many optical techniques such as spectroscopy, radiometry, and imaging, that were employed to characterize and optimize emission from the laser plasma source State of the art EUV spectrographs were employed to observe the source's spectrum under various laser irradiation conditions. Comparing the experimental spectra to those from theory, has allowed the determination of the Sn ion stages responsible for emitting into the useful EUV bandwidth. Experimental results were compared to spectral simulations obtained using Collisional-Radiative Equilibrium (CRE) model, as well. Moreover, extensive measurements surveying source emission from 2 nm to 30 nm, which is the region of the electromagnetic spectrum defined as EUV, was accomplished. Absolutely calibrated metrology was employed with the Flying Circus instrument from which the source's conversion efficiency (CE)--from laser to the useful EUV energy--was characterized under various laser irradiation conditions. Hydrodynamic simulations of the plasma expansion together with the CRE model predicted the condition at which optimum conversion could be attained. The condition was demonstrated experimentally, with the highest CE to be slightly above 2%, which is the highest value among all EUV source contenders. In addition to laser intensity, the CE was found to depend on the laser wavelength. For better understanding, this observation is compared to results from simulations. Through a novel approach in imaging, the size of the plasma was characterized by recording images of the plasma within a narrow band, around 13.5 nm. The size, approximately 100 ìm, is safely within the etendue limit set by the optical elements in the EUV scanner. Finally, the notion of irradiating the target with multiple laser beams was explored for the possibility of improving the source's conversion efficiency.
Show less - Date Issued
- 2006
- Identifier
- CFE0000938, ucf:46733
- Format
- Document (PDF)
- PURL
- http://purl.flvc.org/ucf/fd/CFE0000938
- Title
- FEMTOSECOND LASER WRITTEN VOLUMETRIC DIFFRACTIVE OPTICAL ELEMENTS AND THEIR APPLICATIONS.
- Creator
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Choi, Jiyeon, Richardson, Martin, University of Central Florida
- Abstract / Description
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Since the first demonstration of femtosecond laser written waveguides in 1996, femtosecond laser direct writing (FLDW) has been providing a versatile means to fabricate embedded 3-D microstructures in transparent materials. The key mechanisms are nonlinear absorption processes that occur when a laser beam is tightly focused into a material and the intensity of the focused beam reaches the range creating enough free electrons to induce structural modification. One of the most useful features...
Show moreSince the first demonstration of femtosecond laser written waveguides in 1996, femtosecond laser direct writing (FLDW) has been providing a versatile means to fabricate embedded 3-D microstructures in transparent materials. The key mechanisms are nonlinear absorption processes that occur when a laser beam is tightly focused into a material and the intensity of the focused beam reaches the range creating enough free electrons to induce structural modification. One of the most useful features that can be exploited in fabricating photonic structures is the refractive index change which results from the localized energy deposition. The laser processing system for FLDW can be realized as a compact, desktop station, implemented by a laser source, a 3-D stage and focusing optics. Thus, FLDW can be readily adopted for the fabrication of the photonic devices. For instance, it has been widely employed in various areas of photonic device fabrication such as active and passive waveguides, couplers, gratings, opto-fluidics and similar applications. This dissertation describes the use of FLDW towards the fabrication of custom designed diffractive optical elements (DOE's). These are important micro-optical elements that are building blocks in integrated optical devices including on-chip sensors and systems. The fabrication and characterization of laser direct written DOEs in different glass materials is investigated. The design and performance of a range of DOE's is described, especially, laser-written embedded Fresnel zone plates and linear gratings. Their diffractive efficiency as a function of the fabrication parameters is discussed and an optimized fabrication process is realized. The potential of the micro-DOEs and their integration shown in this dissertation will impact on the fabrication of future on-chip devices involving customized DOEs that will serve great flexibility and multi-functional capability on sensing, imaging and beam shaping.
Show less - Date Issued
- 2009
- Identifier
- CFE0002958, ucf:47984
- Format
- Document (PDF)
- PURL
- http://purl.flvc.org/ucf/fd/CFE0002958
- Title
- POWER SCALING OF LARGE MODE AREA THULIUM FIBER LASERS IN VARIOUS SPECTRAL AND TEMPORAL REGIMES.
- Creator
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McComb, Timothy, Richardson, Martin, University of Central Florida
- Abstract / Description
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High power thulium fiber lasers are interesting for a myriad of applications due to their potential for high average output power, excellent beam quality, compactness, portability, high operating efficiency and broad, eye-safe spectral range from 1.8-2.1 microns. Currently, the majority of thulium laser research effort is being invested into scaling average output powers; however, such output powers are being scaled with no degree of control on laser system output spectrum or temporal...
Show moreHigh power thulium fiber lasers are interesting for a myriad of applications due to their potential for high average output power, excellent beam quality, compactness, portability, high operating efficiency and broad, eye-safe spectral range from 1.8-2.1 microns. Currently, the majority of thulium laser research effort is being invested into scaling average output powers; however, such output powers are being scaled with no degree of control on laser system output spectrum or temporal behavior. Thulium fiber laser technology is not useful for many of its most important applications without implementation of techniques enabling tunable, narrow spectral widths with appropriate pulse durations for particular applications. This work outlines several techniques for spectral control of thulium fiber lasers and investigates scaling of average laser powers while using these techniques to maintain a desired spectral output. In addition, an examination of operation in both nanosecond and picosecond pulsed regimes and scaling of average powers and pulse energies in these regimes to useful power levels is conducted. The demonstration of thulium fiber laser systems for applications in frequency conversion and spectral beam combination is also discussed. In addition to the experimental results, theoretical modeling of thulium fiber amplifier operation, simple thermal management analysis, as well as practical fiber and system design considerations for future power scaling are presented. Experimental and theoretical results of this work will enable the successful design of future extremely high power spectrally and temporally controlled thulium fiber laser systems.
Show less - Date Issued
- 2009
- Identifier
- CFE0002885, ucf:48045
- Format
- Document (PDF)
- PURL
- http://purl.flvc.org/ucf/fd/CFE0002885
- Title
- FEW-CYCLE PULSES AMPLIFICATION FOR ATTOSECOND SCIENCE APPLICATIONS: MODELING AND EXPERIMENTS.
- Creator
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Hemmer, Michael, Richardson, Martin, University of Central Florida
- Abstract / Description
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The emergence of mode-locked oscillators providing pulses with durations as short as a few electric-field cycles in the near infra-red has paved the way toward electric-field sensitive physics experiments. In addition, the control of the relative phase between the carrier and the pulse envelope, developed in the early 2000's and rewarded by a Nobel price in 2005, now provides unprecedented control over the pulse behaviour. The amplification of such pulses to the millijoule level has been an...
Show moreThe emergence of mode-locked oscillators providing pulses with durations as short as a few electric-field cycles in the near infra-red has paved the way toward electric-field sensitive physics experiments. In addition, the control of the relative phase between the carrier and the pulse envelope, developed in the early 2000's and rewarded by a Nobel price in 2005, now provides unprecedented control over the pulse behaviour. The amplification of such pulses to the millijoule level has been an on-going task in a few world-class laboratories and has triggered the dawn of attoscience, the science of events happening on an attosecond timescale. This work describes the theoretical aspects, modeling and experimental implementation of HERACLES, the Laser Plasma Laboratory optical parametric chirped pulse amplifier (OPCPA) designed to deliver amplified carrier-envelope phase stabilized 8-fs pulses with energy beyond 1 mJ at repetition rates up to 10 kHz at 800 nm central wavelength. The design of the hybrid fiber/solid-state amplifier line delivering 85-ps pulses with energy up to 10 mJ at repetition rates in the multi-kHz regime tailored for pumping the optical parametric amplifier stages is presented. The novel stretcher/compressor design of HERACLES, suitable for handling optical pulses with spectra exceeding 300 nm of bandwidth with unprecedented flexibility, is fully modeled and also presented in the frame of this thesis. Finally, a 3D model of the multi-stage non-collinear optical parametric amplifier is also reported. The current and foreseen overall performances of HERACLES are presented. This facility is designed to enable attosecond physics experiments, high-harmonic generation and physics of plasma studies.
Show less - Date Issued
- 2011
- Identifier
- CFE0003576, ucf:48931
- Format
- Document (PDF)
- PURL
- http://purl.flvc.org/ucf/fd/CFE0003576
- Title
- EXTREME ULTRAVIOLET SPECTRAL STREAK CAMERA.
- Creator
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Szilagyi, John, Richardson, Martin, University of Central Florida
- Abstract / Description
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The recent development of extreme ultraviolet (EUV) sources has increased the need for diagnostic tools, and has opened up a previously limited portion of the spectrum. With ultrafast laser systems and spectroscopy moving into shorter timescales and wavelengths, the need for nanosecond scale imaging of EUV is increasing. EUVÂÂÂÂ's high absorption has limited the number of imaging options due...
Show moreThe recent development of extreme ultraviolet (EUV) sources has increased the need for diagnostic tools, and has opened up a previously limited portion of the spectrum. With ultrafast laser systems and spectroscopy moving into shorter timescales and wavelengths, the need for nanosecond scale imaging of EUV is increasing. EUVÂÂÂÂ's high absorption has limited the number of imaging options due to the many atomic resonances in this spectrum. Currently EUV is imaged with photodiodes and X-ray CCDs. However photodiodes are limited in that they can only resolve intensity with respect to time and X-ray CCDs are limited to temporal resolution in the microsecond range. This work shows a novel approach to imaging EUV light over a nanosecond time scale, by using an EUV scintillator to convert EUV to visible light imaged by a conventional streak camera. A laser produced plasma, using a mass-limited tin based target, provided EUV light which was imaged by a grazing incidence flat field spectrometer onto a Ce:YAG scintillator. The EUV spectrum (5 nm-20 nm) provided by the spectrometer is filter by a zirconium filter and then converted by the scintillator to visible light (550 nm) which can then be imaged with conventional optics. Visible light was imaged by an electron image tube based streak camera. The streak camera converts the visible light image to an electron image using a photocathode, and sweeps the image across a recording medium. The streak camera also provides amplification and gating of the image by the means of a micro channel plate, within the image tube, to compensate for low EUV intensities. The system provides 42 ns streaked images of light with a temporal resolution of 440 ps at a repetition rate of 1 Hz. Upon calibration the EUV streak camera developed in this work will be used in future EUV development.
Show less - Date Issued
- 2010
- Identifier
- CFE0003558, ucf:48905
- Format
- Document (PDF)
- PURL
- http://purl.flvc.org/ucf/fd/CFE0003558
- Title
- LASER INDUCED BREAKDOWN SPECTROSCOPY FOR DETECTION OF ORGANIC RESIDUES: IMPACT OF AMBIENT ATMOSPHERE AND LASER PARAMETERS.
- Creator
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Brown, Christopher, Richardson, Martin, University of Central Florida
- Abstract / Description
-
Laser Induced Breakdown Spectroscopy (LIBS) is showing great potential as an atomic analytical technique. With its ability to rapidly analyze all forms of matter, with little-to-no sample preparation, LIBS has many advantages over conventional atomic emission spectroscopy techniques. With the maturation of the technologies that make LIBS possible, there has been a growing movement to implement LIBS in portable analyzers for field applications. In particular, LIBS has long been considered the...
Show moreLaser Induced Breakdown Spectroscopy (LIBS) is showing great potential as an atomic analytical technique. With its ability to rapidly analyze all forms of matter, with little-to-no sample preparation, LIBS has many advantages over conventional atomic emission spectroscopy techniques. With the maturation of the technologies that make LIBS possible, there has been a growing movement to implement LIBS in portable analyzers for field applications. In particular, LIBS has long been considered the front-runner in the drive for stand-off detection of trace deposits of explosives. Thus there is a need for a better understanding of the relevant processes that are responsible for the LIBS signature and their relationships to the different system parameters that are helping to improve LIBS as a sensing technology. This study explores the use of LIBS as a method to detect random trace amounts of specific organic materials deposited on organic or non-metallic surfaces. This requirement forces the limitation of single-shot signal analysis. This study is both experimental and theoretical, with a sizeable component addressing data analysis using principal components analysis to reduce the dimensionality of the data, and quadratic discriminant analysis to classify the data. In addition, the alternative approach of 'target factor analysis' was employed to improve detection of organic residues on organic substrates. Finally, a new method of characterizing the laser-induced plasma of organics, which should lead to improved data collection and analysis, is introduced. The comparison between modeled and experimental measurements of plasma temperatures and electronic density is discussed in order to improve the present models of low-temperature laser induced plasmas.
Show less - Date Issued
- 2011
- Identifier
- CFE0003708, ucf:48843
- Format
- Document (PDF)
- PURL
- http://purl.flvc.org/ucf/fd/CFE0003708
- Title
- PHOTODISRUPTION IN OCULAR TISSUE NEAR AND AT THE BOUNDARY BETWEEN THE ANTERIOR CHAMBER AND CRYSTALLINE LENS.
- Creator
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Olmstead, Richard, Richardson, Martin, University of Central Florida
- Abstract / Description
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Lasers have been involved in Ophthalmology in the treatment of myopia and hyperopia for several years. Laser systems have transformed patients' quality of life, freeing them from the need for glasses, as in the case of LASIK. Ultrafast lasers have played an important role in surgery of the eye. In LASIK, they are used to cut the flap that is lifted to expose the stroma for UV Excimer laser treatment of this region. They are now being used for surgery deeper into the eye,for instance, treating...
Show moreLasers have been involved in Ophthalmology in the treatment of myopia and hyperopia for several years. Laser systems have transformed patients' quality of life, freeing them from the need for glasses, as in the case of LASIK. Ultrafast lasers have played an important role in surgery of the eye. In LASIK, they are used to cut the flap that is lifted to expose the stroma for UV Excimer laser treatment of this region. They are now being used for surgery deeper into the eye,for instance, treating the lens as part of treatments for cataract surgery. The use of ultrafast lasers in cataract surgery and how they can be applied to achieve better surgical outcomes is the focus of this work. It reports on an investigation of laser interaction at and near the anterior of the lens, in particular the boundary between the fibrous mass, capsule, and anterior chamber of the eye. The study reviews the biomechanics of the eye, develops an interaction model with lens tissue, and reports for the first time clinically studies using ex vivo testing of porcine eyes. The components of the treatment laser system are described along with the requirements. Results of the experiments are outlined and discussed, followed by a summary and conclusions including discussion of areas for further research.
Show less - Date Issued
- 2011
- Identifier
- CFE0003658, ucf:48817
- Format
- Document (PDF)
- PURL
- http://purl.flvc.org/ucf/fd/CFE0003658
- Title
- FABRICATION OF INTEGRATED OPTOFLUIDIC CIRCUITS IN CHALCOGENIDE GLASS USING FEMTOSECOND LASER DIRECT WRITING.
- Creator
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Anderson, Troy, Richardson, Martin, University of Central Florida
- Abstract / Description
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Femtosecond laser direct writing (FLDW) is a versatile process that uses focused femtosecond pulses to modify the physical structure of a material, which can result in a shift of optical properties such as the linear and nonlinear refractive index. If the photon energy of the femtosecond pulses lies below the material bandgap, nonlinear absorption rather than linear absorption becomes the dominant mechanism of energy transfer to the material. In this manner, a focused femtosecond pulse train...
Show moreFemtosecond laser direct writing (FLDW) is a versatile process that uses focused femtosecond pulses to modify the physical structure of a material, which can result in a shift of optical properties such as the linear and nonlinear refractive index. If the photon energy of the femtosecond pulses lies below the material bandgap, nonlinear absorption rather than linear absorption becomes the dominant mechanism of energy transfer to the material. In this manner, a focused femtosecond pulse train can be used to fabricate functional features such as optical waveguides, diffractive optical elements, or micro-fluidic elements within the volume of a transparent medium. In this dissertation, the utility of femtosecond laser processing as a fabrication technique of optical and micro-fluidic elements in chalcogenide glasses is explored. The photo-induced modifications of optical and chemical parameters of new germanium-based Chalcogenide glasses in both bulk and thin-film form are characterized for the first time and the impact of material composition and laser fabrication parameters are discussed. The glasses are found to display an increase in volume, a decrease of the linear optical refractive index, and an increase of the nonlinear refractive index when exposed to femtosecond laser pulses. A model based on avalanche ionization and multi-photon ionization is used to describe the highly nonlinear absorption of laser light in the material and correlate the photo-induced modifications to the electron density generated during irradiation. The magnitude of the induced photo- modification is shown to be dependent on laser parameters such as laser dose and repetition rate. The fabrication of microfluidic elements through both direct ablation and the preferential etching of photo-modified regions is also explored. Finally, the integration of both optical elements and fluidic elements fabricated by FLDW into a single substrate is discussed.
Show less - Date Issued
- 2010
- Identifier
- CFE0002978, ucf:47965
- Format
- Document (PDF)
- PURL
- http://purl.flvc.org/ucf/fd/CFE0002978
- Title
- NONLINEAR FEMTOSECOND NEAR INFRARED LASER STRUCTURING IN OXIDE GLASSES.
- Creator
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Royon, Arnaud, Richardson, Martin, University of Central Florida
- Abstract / Description
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Three-dimensional femtosecond laser structuring has a growing interest because of its ease of implementation and the numerous possible applications in the domain of photonic components. Structures such as waveguides, diffraction gratings, optical memories or photonic crystals can be fabricated thanks to this technique. Its use with oxide glasses is promising because of several advantages; they are resistant to flux and ageing, their chemical composition can easily be changed to fit the well...
Show moreThree-dimensional femtosecond laser structuring has a growing interest because of its ease of implementation and the numerous possible applications in the domain of photonic components. Structures such as waveguides, diffraction gratings, optical memories or photonic crystals can be fabricated thanks to this technique. Its use with oxide glasses is promising because of several advantages; they are resistant to flux and ageing, their chemical composition can easily be changed to fit the well-defined requirements of an application. They can already be found in Raman amplifiers, optical fibers, fiber lasers, and other devices. This thesis is based on two axes. The first axis consists in characterizing the linear and nonlinear optical properties of bulk vitreous materials in order to optimize their composition with a particular application in view. Within this context, the nonlinear optical properties, their physical origins (electronic and nuclear) as well as their characteristic response times (from a few femtoseconds to a few hundreds of picoseconds) are described within the Born-Oppenheimer approximation. Fused silica and several sodium-borophosphate glasses containing different concentrations in niobium oxide have been studied. Results show that the nonlinear optical properties of fused silica are mainly from electronic origin, whereas in the sodium-borophosphate glasses, the contribution from nuclear origin becomes predominant when the concentration of niobium oxide exceeds 30%. The second axis is based on the structuring of materials. Three commercially available fused silica samples presenting different fabrication conditions (therefore distinct impurity levels) and irradiated with a near infrared femtosecond laser have been studied. The laser induced defects have been identified by means of several spectroscopic techniques. They show the formation of color centers as well as a densification inside the irradiated area. Their linear refractive index and nonlinear third-order susceptibility properties have been measured. Moreover, the structuring of fused silica at the subwavelength scale into "nanogratings" is observed and the form of birefringence induced by these structures is discussed. In addition to the fused silica samples, several oxide glasses presenting very distinct chemical compositions have been studied. A sodium-borophosphate glass containing niobium oxide exhibits micro-cracks and nano-crystallites following irradiation. A silicate glass with or without a silver component reveals fluorescent rings or "nanograting" structures. A zinc phosphate glass containing silver also presents fluorescent ring structures, with a size of the order of 80 nm, well below the diffraction limit. Pump-probe microscope techniques have been performed on this glass to investigate the laser-glass interaction. The absorption mechanism is determined to be four-photon absorption. The generated free electron density is ~ 1017 cm-3, which suggests the conclusion that an electron gas rather than a plasma is formed during the laser irradiation.
Show less - Date Issued
- 2009
- Identifier
- CFE0002666, ucf:48200
- Format
- Document (PDF)
- PURL
- http://purl.flvc.org/ucf/fd/CFE0002666
- Title
- CHARACTERIZATION AND MODELING OF A HIGH POWER THIN DISK LASER.
- Creator
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Rodriguez-Valls, Omar, Richardson, Martin, University of Central Florida
- Abstract / Description
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High power lasers have been adapted to material processing, energy, military and medical applications. In the Laser Plasma Laboratory at CREOL, UCF, high power lasers are used to produce highly ionized plasmas to generate EUV emission. This thesis examines the quality of a recently acquired high power thin disk laser through thermal modeling and beam parameter measurements. High power lasers suffer from thermally induced issues which degrade their operation. Thin disk lasers use an innovative...
Show moreHigh power lasers have been adapted to material processing, energy, military and medical applications. In the Laser Plasma Laboratory at CREOL, UCF, high power lasers are used to produce highly ionized plasmas to generate EUV emission. This thesis examines the quality of a recently acquired high power thin disk laser through thermal modeling and beam parameter measurements. High power lasers suffer from thermally induced issues which degrade their operation. Thin disk lasers use an innovative heat extraction mechanism that eliminates the transverse thermal gradient within the gain medium associated with thermal lensing. A thorough review of current thin disk laser technology is described. Several measurement techniques were performed on a high power thin disk laser. The system efficiencies, spectrum, and temporal characteristics were examined. The laser was characterized in the far-field regime to determine the beam quality and intensity of the laser. Laser cavity simulations of the thin disk laser were performed using LASCAD. The induced thermal and stress effects are demonstrated. Simulated output power and efficiency is compared to those that have been quantified experimentally.
Show less - Date Issued
- 2010
- Identifier
- CFE0003216, ucf:48578
- Format
- Document (PDF)
- PURL
- http://purl.flvc.org/ucf/fd/CFE0003216
- Title
- LASER PLASMA RADIATION STUDIES FOR DROPLET SOURCES IN THE EXTREME ULTRAVIOLET.
- Creator
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Kamtaprasad, Reuvani, Richardson, Martin, University of Central Florida
- Abstract / Description
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The advancement of laboratory based Extreme Ultraviolet (EUV) radiation has escalated with the desire to use EUV as a source for semiconductor device printing. Laser plasmas based on a mass-limited target concept, developed within the Laser Plasma Laboratory demonstrate a much needed versatility for satisfying rigorous source requirements. This concept produces minimal debris concerns and allows for the attainment of high repetition rates as well as the accommodation of various laser and...
Show moreThe advancement of laboratory based Extreme Ultraviolet (EUV) radiation has escalated with the desire to use EUV as a source for semiconductor device printing. Laser plasmas based on a mass-limited target concept, developed within the Laser Plasma Laboratory demonstrate a much needed versatility for satisfying rigorous source requirements. This concept produces minimal debris concerns and allows for the attainment of high repetition rates as well as the accommodation of various laser and target configurations. This work demonstrates the generation of EUV radiation by creating laser plasmas from mass-limited targets with indium, tin, and antimony doped droplets. Spectral emission from the laser plasmas is quantified using a flat-field spectrometer. COWAN code oscillator strength predications for each of the dopants were convolved with narrow Gaussian functions creating synthetic spectra for the EUV region between 10 nm - 20 nm. A preliminary comparison was made between the theoretical spectra and experimental results. From this comparison, ion stage transitions for each of the hot dense plasmas generated were assessed.
Show less - Date Issued
- 2010
- Identifier
- CFE0003168, ucf:48597
- Format
- Document (PDF)
- PURL
- http://purl.flvc.org/ucf/fd/CFE0003168
- Title
- Engineering and Application of Ultrafast Laser Pulses and Filamentation in Air.
- Creator
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Barbieri, Nicholas, Richardson, Martin, University of Central Florida
- Abstract / Description
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Continuing advances in laser and photonic technology has seen the development of lasers with increasing power and increasingly short pulsewidths, which have become available over an increasing range of wavelengths. As the availability of laser sources grow, so do their applications. To make better use of this improving technology, understanding and controlling laser propagation in free space is critical, as is understanding the interaction between laser light and matter.The need to better...
Show moreContinuing advances in laser and photonic technology has seen the development of lasers with increasing power and increasingly short pulsewidths, which have become available over an increasing range of wavelengths. As the availability of laser sources grow, so do their applications. To make better use of this improving technology, understanding and controlling laser propagation in free space is critical, as is understanding the interaction between laser light and matter.The need to better control the light obtained from increasingly advanced laser sources leads to the emergence of beam engineering, the systematic understanding and control of light through refractive media and free space. Beam engineering enables control over the beam shape, energy and spectral composition during propagation, which can be achieved through a variety of means. In this dissertation, several methods of beam engineering are investigated. These methods enable improved control over the shape and propagation of laser light. Laser-matter interaction is also investigated, as it provides both a means to control the propagation of pulsed laser light through the atmosphere, and provides a means to generation remote sources of radiation.
Show less - Date Issued
- 2013
- Identifier
- CFE0004650, ucf:49881
- Format
- Document (PDF)
- PURL
- http://purl.flvc.org/ucf/fd/CFE0004650
- Title
- Laser-induced crystallization mechanisms in chalcogenide glass materials for advanced optical functionality.
- Creator
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Sisken, Laura, Richardson, Kathleen, Richardson, Martin, Shah, Lawrence, University of Central Florida
- Abstract / Description
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Glass-ceramics (GC) are promising candidates for gradient refractive index (GRIN) optics. These multi-phase, composite materials also exhibit improved physical properties as compared to the parent base glass resulting from the formation of a secondary crystalline phase(s). Nanocrystal phase formation in a multi-component chalcogenide glass (ChG), (GeSe2-3As2Se3)(1-x)-(PbSe)x glass where x = 0-40 has been investigated, and the role of the starting material morphology has been correlated to the...
Show moreGlass-ceramics (GC) are promising candidates for gradient refractive index (GRIN) optics. These multi-phase, composite materials also exhibit improved physical properties as compared to the parent base glass resulting from the formation of a secondary crystalline phase(s). Nanocrystal phase formation in a multi-component chalcogenide glass (ChG), (GeSe2-3As2Se3)(1-x)-(PbSe)x glass where x = 0-40 has been investigated, and the role of the starting material morphology has been correlated to the resulting composite's optical properties including refractive index, transmission, dispersion, and thermo-optic coefficient. Optical property evolution was related to the type and amount of the crystal phases formed, since through control of the local volume fraction of crystalline phase(s), the effective material properties of the composite can locally be varied. Through computational and experimental studies, tailored nanocomposites exhibiting gradient index properties have been realized. A Raman spectroscopic technique was developed as a means to spatially quantify the extent of conversion from glass to glass ceramic, and to confirm that the scale length of the local refractive index modification can be correlated to the extent of crystallization as validated by X-ray diffraction (XRD). Spatial control of the crystallization was examined by using a laser to locally modify the amount of nucleation and/or growth of crystallites in the glass. A novel technique converse to laser-induced crystallization was also developed and demonstrated that a glass ceramic could be locally re-vitrified back to a fully glassy state, through a laser-induced vitrification (LIV) method. Proof-of-concept demonstrator optics were developed using furnace and laser induced crystallization methods to validate experimental and computational approaches to modify the local volume fraction of nano-crystals. These demonstrators exhibited tailorable optical functionality as focusing optics and diffractive optics. This work paves the way for the design and fabrication of nanocomposite GRIN optics and their use in the mid-wave infrared.
Show less - Date Issued
- 2017
- Identifier
- CFE0006916, ucf:51684
- Format
- Document (PDF)
- PURL
- http://purl.flvc.org/ucf/fd/CFE0006916
- Title
- Distribution of Laser Induced Heating in Multi-Component Chalcogenide Glass and its Associated Effects.
- Creator
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Sisken, Laura, Richardson, Kathleen, Richardson, Martin, Shah, Lawrence, University of Central Florida
- Abstract / Description
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Chalcogenide glasses are well known to have good transparency into the infrared spectrum. These glasses though tend to have low thresholds as compared to oxide glasses for photo-induced changes and thermally-induced changes. Material modification such as photo-induced darkening, bleaching, refractive index change, densification or expansion, ablation of crystallization have been demonstrated, and are typically induced by a thermal furnace-based heat treatment, an optical source such as a...
Show moreChalcogenide glasses are well known to have good transparency into the infrared spectrum. These glasses though tend to have low thresholds as compared to oxide glasses for photo-induced changes and thermally-induced changes. Material modification such as photo-induced darkening, bleaching, refractive index change, densification or expansion, ablation of crystallization have been demonstrated, and are typically induced by a thermal furnace-based heat treatment, an optical source such as a laser, or a combination of photo-thermal interactions. Solely employing laser-based heating has an advantage over a furnace, since one has the potential to be able to spatially modify the materials properties with much greater precision by moving either the beam or the sample.The main properties of ChG glasses investigated in this study were the light-induced and thermally-induced modification of the glass through visible microscopy, white light interferometry, and Raman spectroscopy. Additionally computational models were developed in order to aid in determining what temperature rise should be occurring under the conditions used in experiments.It was seen that ablation, photo-expansion, crystallization, and melting could occur for some of the irradiation conditions that were used. The above bandgap energy simulations appeared to overestimate the maximum temperature that should have been reached in the sample, while the below bandgap energy simulations appeared to underestimate the maximum temperature that should have been reached in the sample. Ultimately, this work produces the ground work to be able to predict and control dose, and therefore heating, to induce localized crystallization and phase change.
Show less - Date Issued
- 2014
- Identifier
- CFE0005261, ucf:50606
- Format
- Document (PDF)
- PURL
- http://purl.flvc.org/ucf/fd/CFE0005261
