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- Title
- GATE STACK AND CHANNEL ENGINEERING:STUDY OF METAL GATES AND GERMANIUM CHANNEL DEVICES.
- Creator
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Todi, Ravi, Sundaram, Kalpathy, University of Central Florida
- Abstract / Description
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The continued scaling of device dimensions in complementary metal oxide semiconductor (CMOS) technology within the sub-100 nm region requires an alternative high dielectric constant (high-κ) oxide layer to counter high tunneling leakage currents, a metallic gate electrode to address polysilicon depletion, boron penetration and high polysilicon sheet resistance, and high mobility channel materials to boost the CMOS performance. Metal gates can also offer improved thermal and chemical...
Show moreThe continued scaling of device dimensions in complementary metal oxide semiconductor (CMOS) technology within the sub-100 nm region requires an alternative high dielectric constant (high-κ) oxide layer to counter high tunneling leakage currents, a metallic gate electrode to address polysilicon depletion, boron penetration and high polysilicon sheet resistance, and high mobility channel materials to boost the CMOS performance. Metal gates can also offer improved thermal and chemical stability, but their use requires that we improve our understanding of how the metal alloy phase, crystallographic orientation, and composition affect the electronic properties of the metal alloy-oxide interface. To replace n++ and p++ polysilicon gate electrodes and maintain scaled device performance requires metal gate electrodes with work functions within 0.2 eV of the silicon conduction and valence band edges, i.e., 5.0-5.2 and 4.1-4.3 eV, for PMOS and NMOS devices, respectively. In addition to work function and thermal/chemical stability, metal gates must be integrated into the CMOS process flow. It is the aim of this work to significantly expand our knowledge base in alloys for dual metal gates by carrying out detailed electrical and materials studies of the binary alloy systems of Ru with p-type metal Pt. Three n-type metals systems, Ru-Ta, Ru-Hf and Ru-Nb have also been partially investigated. This work also focuses on high mobility Ge p-MOSFETs for improved CMOS performance. DC magnetron sputtering has been used to deposit binary alloy films on thermally grown SiO2. The composition of the alloy films have been determined by Rutherford backscattering spectrometry and the identification of phases present have been made using x-ray and electron diffraction of samples. The microstructure of the phases of interest has been examined in the transmission electron microscope and film texture was characterized via x-ray diffraction. The electrical characterization includes basic resistivity measurements, and work function extraction. The work function has been determined from MOS capacitor and Schottky diodes. The need for electron and hole mobility enhancement and the progress in the development of high-κ gate stacks, has lead to renewed interest in Ge MOSFETs. The p-MOS mobility data for Ge channel devices have been reported. The results indicate greater than 2 x improvements in device mobility as compared to standard Si device. A low frequency noise assessment of silicon passivated Ge p-MOSFETs with a TiN/TaN/HfO2 gate stack has been made. For the first time we also report results on low frequency noise characterisation for a Ge P+- n junctions with and without Ni germanidation.
Show less - Date Issued
- 2007
- Identifier
- CFE0001554, ucf:47122
- Format
- Document (PDF)
- PURL
- http://purl.flvc.org/ucf/fd/CFE0001554
- Title
- ELECTROMECHANICAL LIFTING ACTUATION OF A MEMS CANTILEVER AND NANO-SCALE ANALYSIS OF DIFFUSION IN SEMICONDUCTOR DEVICE DIELECTRICS.
- Creator
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Rezadad, Imen, Peale, Robert, Del Barco, Enrique, Tetard, Laurene, Prenitzer, Brenda, University of Central Florida
- Abstract / Description
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This dissertation presents experimental and theoretical studies of physical phenomena in micro- and nano-electronic devices. Firstly, a novel and unproven means of electromechanical actuation in a micro-electro-mechanical system (MEMS) cantilever was investigated. In nearly all MEMS devices, electric forces cause suspended components to move toward the substrate. I demonstrated a design with the unusual and potentially very useful property of having a suspended MEMS cantilever lift away from...
Show moreThis dissertation presents experimental and theoretical studies of physical phenomena in micro- and nano-electronic devices. Firstly, a novel and unproven means of electromechanical actuation in a micro-electro-mechanical system (MEMS) cantilever was investigated. In nearly all MEMS devices, electric forces cause suspended components to move toward the substrate. I demonstrated a design with the unusual and potentially very useful property of having a suspended MEMS cantilever lift away from the substrate. The effect was observed by optical micro-videography, by electrical sensing, and it was quantified by optical interferometry. The results agree with predictions of analytic and numerical calculations. One potential application is infrared sensing in which absorbed radiation changes the temperature of the cantilever, changing the duty cycle of an electrically-driven, repetitively closing micro-relay.Secondly, ultra-thin high-k gate dielectric layers in two 22 nm technology node semiconductor devices were studied. The purpose of the investigation was to characterize the morphology and composition of these layers as a means to verify whether the transmission electron microscope (TEM) with energy dispersive spectroscopy (EDS) could sufficiently resolve the atomic diffusion at such small length scales. Results of analytic and Monte-Carlo numerical calculations were compared to empirical data to validate the ongoing viability of TEM EDS as a tool for nanoscale characterization of semiconductor devices in an era where transistor dimensions will soon be less than 10 nm.
Show less - Date Issued
- 2015
- Identifier
- CFE0006228, ucf:51075
- Format
- Document (PDF)
- PURL
- http://purl.flvc.org/ucf/fd/CFE0006228
