Current Search: Plasma (x)
Pages
-
-
Title
-
PHOTODISRUPTION IN OCULAR TISSUE NEAR AND AT THE BOUNDARY BETWEEN THE ANTERIOR CHAMBER AND CRYSTALLINE LENS.
-
Creator
-
Olmstead, Richard, Richardson, Martin, University of Central Florida
-
Abstract / Description
-
Lasers have been involved in Ophthalmology in the treatment of myopia and hyperopia for several years. Laser systems have transformed patients' quality of life, freeing them from the need for glasses, as in the case of LASIK. Ultrafast lasers have played an important role in surgery of the eye. In LASIK, they are used to cut the flap that is lifted to expose the stroma for UV Excimer laser treatment of this region. They are now being used for surgery deeper into the eye,for instance, treating...
Show moreLasers have been involved in Ophthalmology in the treatment of myopia and hyperopia for several years. Laser systems have transformed patients' quality of life, freeing them from the need for glasses, as in the case of LASIK. Ultrafast lasers have played an important role in surgery of the eye. In LASIK, they are used to cut the flap that is lifted to expose the stroma for UV Excimer laser treatment of this region. They are now being used for surgery deeper into the eye,for instance, treating the lens as part of treatments for cataract surgery. The use of ultrafast lasers in cataract surgery and how they can be applied to achieve better surgical outcomes is the focus of this work. It reports on an investigation of laser interaction at and near the anterior of the lens, in particular the boundary between the fibrous mass, capsule, and anterior chamber of the eye. The study reviews the biomechanics of the eye, develops an interaction model with lens tissue, and reports for the first time clinically studies using ex vivo testing of porcine eyes. The components of the treatment laser system are described along with the requirements. Results of the experiments are outlined and discussed, followed by a summary and conclusions including discussion of areas for further research.
Show less
-
Date Issued
-
2011
-
Identifier
-
CFE0003658, ucf:48817
-
Format
-
Document (PDF)
-
PURL
-
http://purl.flvc.org/ucf/fd/CFE0003658
-
-
Title
-
High resolution time-resolved imaging system in the vacuum ultraviolet region.
-
Creator
-
Jang, Yuseong, Richardson, Martin, Moharam, Jim, Likamwa, Patrick, University of Central Florida
-
Abstract / Description
-
High-power debris-free vacuum ultraviolet (VUV) light sources have applications in several scientific and engineering areas, such as high volume manufacturing lithography and inspection tools in the semiconductor industry, as well as other applications in material processing and photochemistry.For the past decades, the semiconductor industry has been driven by what is called "Moore's Law". The entire semiconductor industry relies on this rule, which requires chip makers to pack transistors...
Show moreHigh-power debris-free vacuum ultraviolet (VUV) light sources have applications in several scientific and engineering areas, such as high volume manufacturing lithography and inspection tools in the semiconductor industry, as well as other applications in material processing and photochemistry.For the past decades, the semiconductor industry has been driven by what is called "Moore's Law". The entire semiconductor industry relies on this rule, which requires chip makers to pack transistors more tightly with every new generation of chips, shrinking the size of transistors. The ability to solve roadmap challenges is, at least partly, proportional to our ability to measure them. The focus of this thesis is on imaging transient VUV laser plasma sources with specialized reflective imaging optics for metrology applications. The plasma dynamics in novel laser-based Zinc and Tin plasma sources will be discussed. The Schwarzschild optical system was installed to investigate the time evolution of the plasma size in the VUV region at wavelengths of 172 nm and 194 nm. The outcomes are valuable for interpreting the dynamics of low-temperature plasma and to optimize laser-based VUV light sources.
Show less
-
Date Issued
-
2014
-
Identifier
-
CFE0005352, ucf:50492
-
Format
-
Document (PDF)
-
PURL
-
http://purl.flvc.org/ucf/fd/CFE0005352
-
-
Title
-
Dynamical Invariants and the Fluid Impulse in Plasma Models.
-
Creator
-
Michalak, Martin, Shivamoggi, Bhimsen, Mohapatra, Ram, Brennan, Joseph, Eastes, Richard, University of Central Florida
-
Abstract / Description
-
Much progress has been made in understanding of plasmas through the use of the MHD equations and newer models such as Hall MHD and electron MHD. As with most equations of fluid behavior, these equations are nonlinear, and no general solutions can be found. The use of invariant structures allows limited predictions of fluid behavior without requiring a full solution of the underlying equations. The use of gauge transformation can allow the creation of new invariants, while differential...
Show moreMuch progress has been made in understanding of plasmas through the use of the MHD equations and newer models such as Hall MHD and electron MHD. As with most equations of fluid behavior, these equations are nonlinear, and no general solutions can be found. The use of invariant structures allows limited predictions of fluid behavior without requiring a full solution of the underlying equations. The use of gauge transformation can allow the creation of new invariants, while differential geometry offers useful tools for constructing additional invariants from those that are already known. Using these techniques, new geometric, integral and topological invariants are constructed for Hall and electron MHD models. Both compressible and incompressible models are considered, where applicable. An application of topological invariants to magnetic reconnection is provided. Finally, a particular geometric invariant, which can be interpreted as the fluid impulse density, is studied in greater detail, its nature and invariance in plasma models is demonstrated, and its behavior is predicted in particular geometries under different models.
Show less
-
Date Issued
-
2013
-
Identifier
-
CFE0005382, ucf:50442
-
Format
-
Document (PDF)
-
PURL
-
http://purl.flvc.org/ucf/fd/CFE0005382
-
-
Title
-
PLASMA TEMPERATURE MEASUREMENTS IN THE CONTEXT OF SPECTRAL INTERFERENCE.
-
Creator
-
Seesahai, Brandon, Baudelet, Matthieu, University of Central Florida
-
Abstract / Description
-
The path explored in this thesis is testing a plasma temperature measurement approach that accounts for interference in a spectrum. The Atomic Emission Spectroscopy (AES) technique used is called Laser Induced Breakdown Spectroscopy (LIBS) and involves focusing a laser pulse to a high irradiance onto a sample to induced a plasma. Spectrally analyzing the plasma light provides a "finger print" or spectrum of the sample. Unfortunately, spectral line broadening is a type of interference...
Show moreThe path explored in this thesis is testing a plasma temperature measurement approach that accounts for interference in a spectrum. The Atomic Emission Spectroscopy (AES) technique used is called Laser Induced Breakdown Spectroscopy (LIBS) and involves focusing a laser pulse to a high irradiance onto a sample to induced a plasma. Spectrally analyzing the plasma light provides a "finger print" or spectrum of the sample. Unfortunately, spectral line broadening is a type of interference encountered in a LIBS spectrum because it blends possible ionic or atomic transitions that occur in plasma. To make use of the information or transitions not resolved in a LIBS spectrum, a plasma temperature method is developed. The basic theory of a LIBS plasma, broadening mechanisms, thermal equilibrium and distribution laws, and plasma temperature methods are discussed as background support for the plasma temperature method tested in this thesis. In summary, the plasma temperature method analyzes the Full Width at Half the Maximum (FWHM) of each spectral line for transitions provided from a database and uses them for temperature measurements. The first implementation of the temperature method was for simulated spectra and the results are compared to other conventional temperature measurement techniques. The temporal evolution of experimental spectra are also taken as a function of time to observe if the newly developed temperature technique can perform temporal measurements. Lastly, the temperature method is tested for a simulated, single element spectrum when considering interferences from all the elements provided in an atomic database. From stimulated and experimental spectra analysis to a global database consideration, the advantages and disadvantages of the temperature method are discussed.
Show less
-
Date Issued
-
2016
-
Identifier
-
CFH2000140, ucf:46057
-
Format
-
Document (PDF)
-
PURL
-
http://purl.flvc.org/ucf/fd/CFH2000140
-
-
Title
-
FLOW CONTROL OF TANDEM CYLINDERS USING PLASMA ACTUATORS.
-
Creator
-
Larsen, Jonah, Bhattacharya, Samik, University of Central Florida
-
Abstract / Description
-
The flow over a set of tandem cylinders at a moderate Reynolds numbers (Re), and with different separation lengths has been studied. Two dimensional (2D) and three-dimensional (3D) plasma actuators were used to control the flow over the leading cylinder to change the vortex shedding, and subsequently the flow on the second cylinder. The 3D plasma actuator was segmented along the length of the cylinder with a spacing of ? = 4 while the 2D actuator simply ran straight down the span of the...
Show moreThe flow over a set of tandem cylinders at a moderate Reynolds numbers (Re), and with different separation lengths has been studied. Two dimensional (2D) and three-dimensional (3D) plasma actuators were used to control the flow over the leading cylinder to change the vortex shedding, and subsequently the flow on the second cylinder. The 3D plasma actuator was segmented along the length of the cylinder with a spacing of ? = 4 while the 2D actuator simply ran straight down the span of the cylinder. Particle image velocimetry (PIV) measurements were used to investigate the flow along the central plane in the wake of the cylinders. The image pairs were processed into velocity grids which were then averaged. Plots of the shear, vorticity, and turbulent kinetic energy were created. These plots are used to understand how the character of vortex shedding from the upstream cylinder changes the same from the downstream one.
Show less
-
Date Issued
-
2018
-
Identifier
-
CFH2000425, ucf:45872
-
Format
-
Document (PDF)
-
PURL
-
http://purl.flvc.org/ucf/fd/CFH2000425
-
-
Title
-
DEBRIS CHARACTERIZATION AND MITIGATION OF DROPLET LASER PLASMA SOURCES FOR EUV LITHOGRAPHY.
-
Creator
-
Takenoshita, Kazutoshi, Richardson, Martin, University of Central Florida
-
Abstract / Description
-
Extreme ultraviolet lithography (EUVL) is a next generation lithographic techniques under development for fabricating semiconductor devices with feature sizes smaller than 32 nm. The optics to be used in the EUVL steppers is reflective optics with multilayer mirror coatings on each surface. The wavelength of choice is 13.5 nm determined by the optimum reflectivity of the mirror coatings. The light source required for this wavelength is derived from a hot-dense plasma produced by either a gas...
Show moreExtreme ultraviolet lithography (EUVL) is a next generation lithographic techniques under development for fabricating semiconductor devices with feature sizes smaller than 32 nm. The optics to be used in the EUVL steppers is reflective optics with multilayer mirror coatings on each surface. The wavelength of choice is 13.5 nm determined by the optimum reflectivity of the mirror coatings. The light source required for this wavelength is derived from a hot-dense plasma produced by either a gas discharge or a laser. This study concentrate only on the laser produced plasma source because of its advantages of scalability to higher repetition rates. The design of a the laser plasma EUVL light source consists of a plasma produced from a high-intensity focused laser beam from a solid/liquid target, from which radiation is generated and collected by a large solid angle mirror or array of mirrors. The collector mirrors have the same reflectivity characteristics as the stepper mirrors. The EUVL light source is considered as the combination of both the hot-dense plasma and the collector mirrors. The EUVL light sources required by the stepper manufacturers must have sufficient EUV output power and long operational lifetimes to meet market-determined chip production rates. The most influential factor in achieving the required EUV output power is the conversion efficiency (CE) of laser input energy relative to the EUV radiation collected. A high CE is demonstrated in a separate research program by colleagues in the Laser Plasma laboratory at CREOL. Another important factor for the light source is the reflectivity lifetime of the collection optics as mirror reflectivity can be degraded by deposition and ablation from the plasma debris. Realization of a high CE but low debris plasma source is possible by reducing the mass of the target, which is accomplished by using tin-doped droplet targets. These have sufficient numbers of tin atoms for high CE, but the debris generation is minimal. The first part of this study investigates debris emissions from tin-doped droplet targets, in terms of aerosols and ions. Numerous tin aerosols can be created during a single laser-target interaction. The effects these interactions are observed and the depositions are investigated using SEM, AFM, AES, XPS, and RBS techniques. The generation of aerosols is found to be the result of incomplete ionization of the target material, corresponding to non-optimal laser coupling to the target for maximum CE. In order to determine the threats of the ion emission to the collector mirror coatings from an optimal, fully ionized target, the ion flux is measured at the mirror distance using various techniques. The ion kinetic energy distributions obtained for individual ion species are quantitatively analyzed. Incorporating these distributions with Monte-Carlo simulations provide lifetime estimation of the collector mirror under the effect of ion sputtering. The current estimated lifetime the tin-doped droplet plasma source is only a factor of 500 less than the stepper manufacturer requirements, without the use of any mitigation schemes to stop these ions interacting with the mirror. The second part of this investigation explores debris mitigation schemes. Two mitigation schemes are applied to tin-doped droplet laser plasmas; electrostatic field mitigation, and a combination of a foil trap with a magnetic field. Both mitigation schemes demonstrate their effectiveness in suppressing aerosols and ion flux. A very small number of high-energy ions still pass through the combination of the two mitigation schemes but the sputtering caused by these ions is too small to offer a threat to mirror lifetime. It is estimated that the lifetime of the collector mirror, and hence the source lifetime, will be sufficient when tin-doped targets are used in combination with these mitigation schemes.
Show less
-
Date Issued
-
2006
-
Identifier
-
CFE0001289, ucf:46920
-
Format
-
Document (PDF)
-
PURL
-
http://purl.flvc.org/ucf/fd/CFE0001289
-
-
Title
-
CONTROL AND STABILIZATION OF LASER PLASMASOURCES FOR EUV LITHOGRAPHY.
-
Creator
-
Cunado, Jose, Richardson, Martin, University of Central Florida
-
Abstract / Description
-
Extreme Ultraviolet (EUV) sources rely on droplet laser plasmas for EUV generation. These sources consist of a small (30 μm diameter) droplet which is excited into plasma emitting EUV around 13.5 nm, the industry's chosen wavelength for EUV lithography (EUVL). These sources are the best candidates for the commercialization of EUVL allowing mass production of computer chips with 32 nm or even smaller feature size. However, the biggest challenges which EUV source developers encounter...
Show moreExtreme Ultraviolet (EUV) sources rely on droplet laser plasmas for EUV generation. These sources consist of a small (30 μm diameter) droplet which is excited into plasma emitting EUV around 13.5 nm, the industry's chosen wavelength for EUV lithography (EUVL). These sources are the best candidates for the commercialization of EUVL allowing mass production of computer chips with 32 nm or even smaller feature size. However, the biggest challenges which EUV source developers encounter today are the issues of conversion efficiency (CE) and debris.In order to satisfy the technology requirements, the source will need to meet high levels of stability, performance, and lifetime. Our tin-doped droplet plasma has demonstrated high CE and low debris resulting in long lifetime. Long term stability is obtained through the use of novel tracking techniques and active feedback. The laser plasma targeting system combines optical illumination and imaging, droplet technology innovation, advanced electronics, and custom software which act in harmony to provide complete stabilization of the droplets. Thus, a stable, debris-free light source combined with suitable collection optics can provide useful EUV radiation power. Detailed description of the targeting system and the evaluation of the system will be presented.
Show less
-
Date Issued
-
2007
-
Identifier
-
CFE0001790, ucf:47278
-
Format
-
Document (PDF)
-
PURL
-
http://purl.flvc.org/ucf/fd/CFE0001790
-
-
Title
-
PLASMA PROCESSING FOR RETENTION OF NANOSTRUCTURES.
-
Creator
-
Venkatachalapathy, Viswanathan, Seal, Sudipta, University of Central Florida
-
Abstract / Description
-
Plasma spray processing is a technique that is used extensively in thermal barrier coatings on gas and steam turbine components, biomedical implants and automotive components. Many processing parameters are involved to achieve a coating with certain functionality. The coating could be required to function as thermal barrier, wear resistant, corrosion resistant or a high temperature oxidation resistant coating. Various parameters, such as, nozzle and electrode design, powder feeding system,...
Show morePlasma spray processing is a technique that is used extensively in thermal barrier coatings on gas and steam turbine components, biomedical implants and automotive components. Many processing parameters are involved to achieve a coating with certain functionality. The coating could be required to function as thermal barrier, wear resistant, corrosion resistant or a high temperature oxidation resistant coating. Various parameters, such as, nozzle and electrode design, powder feeding system, spray distances, substrate temperature and roughness, plasma gas flow rates and others can greatly alter the coating quality and resulting performance. Feedstock (powder or solution precursor) composition and morphology are some of the important variables, which can affect the high end coating applications. The amount of heat a plasma plume has to offer to the particles being processed as a coating depends primarily on the dissociation of the atoms of gaseous mixtures being used to create the plasma and the residence time required for the particle to stay in the flame. The parameters that are conducive for nanostructured retention could be found out if the residence time of the particles in the flame and the available heat in the plume for various gas combinations could be predicted. If the feedstock is a liquid precursor instead of a powder feedstock, the heat that has to be offered by the plasma could be increased by suitable gas combination to achieve a good quality coating. Very little information is available with regard to the selection of process parameters and processing of nano materials feedstock to develop nanostructured coatings using plasma spray. In this study, it has been demonstrated that nano ceramics or ceramic composites either in the form of coatings or bulk free form near net components could be processed using DC plasma spray. For powder feedstock, analytical heat transfer calculations could predict the particle states for a given set of parameters by way of heat input from the plasma to the particles. The parameter selection is rendered easier by means of such calculations. Alumina nano ceramic particles are processed as a coating. During Spray drying, a process of consolidation of nano alumina particles to spherical agglomerates, parameter optimization for complete removal of moisture has been achieved. The parameters are tested for alumina nanoparticles with a plasma torch for the veracity of calculations. The amount of heat transfer from the surface of the agglomerates to the core has been quantified as a function of velocity of particles. Since preparation of nanostructured feedstock for plasma spray is expensive and cumbersome, alternative solution precursor route for direct pyrolysis of precursor to coating has been studied in case of nanocrystalline rare earth oxides. Thus, it has also been shown by this research that nanostructured coatings could be either from a powder feedstock or a solution precursor feedstock. MoSi2-Si3N4, Ni-Al2O3, W-HfC nano ceramic composite systems have been processed as a bulk free form nanocomposite with 60-70% retained nanostructures. The importance of selection of substrates, roughness and the substrate temperature for development of free form bulk components has been highlighted. The improvement in mechanical and high temperature properties associated with having such nanostructured coatings or bulk nanocomposites are revealed. These nanostructured coatings are known for their low thermal conductivity, high wear resistance and can be potentially used as steam and gas turbines coatings for improved thermal efficiency. In summary, bulk nanocomposite through plasma spray processing is a viable alternative to conventional processes such as sintering, HIP for high fracture toughness and hardness applications.
Show less
-
Date Issued
-
2007
-
Identifier
-
CFE0001680, ucf:47203
-
Format
-
Document (PDF)
-
PURL
-
http://purl.flvc.org/ucf/fd/CFE0001680
-
-
Title
-
On Hall Magnetohydrodynamics: X-type Neutral Point and Parker Problem.
-
Creator
-
Reger, Kyle, Shivamoggi, Bhimsen, Rollins, David, Eastes, Richard, University of Central Florida
-
Abstract / Description
-
The framework for the Hall magnetohydrodynamic (MHD) model for plasma physics is built up from kinetic theory and used to analytically solve problems of interest in the field. The Hall MHD model describes fast magnetic reconnection processes in space and laboratory plasmas. Specifically, the magnetic reconnection process at an X-type neutral point, where current sheets form and store enormous amounts of magnetic energy which is later released as magnetic storms when the sheets break up, is...
Show moreThe framework for the Hall magnetohydrodynamic (MHD) model for plasma physics is built up from kinetic theory and used to analytically solve problems of interest in the field. The Hall MHD model describes fast magnetic reconnection processes in space and laboratory plasmas. Specifically, the magnetic reconnection process at an X-type neutral point, where current sheets form and store enormous amounts of magnetic energy which is later released as magnetic storms when the sheets break up, is investigated. The phenomena of magnetic flux pile-up driving the merging of antiparallel magnetic fields at an ion stagnation-point flow in a thin current sheet, called the Parker problem, also receives rigorous mathematical analysis.
Show less
-
Date Issued
-
2012
-
Identifier
-
CFE0004428, ucf:49345
-
Format
-
Document (PDF)
-
PURL
-
http://purl.flvc.org/ucf/fd/CFE0004428
-
-
Title
-
Rare Earth Oxide Coating with Controlled Chemistry Using Thermal Spray.
-
Creator
-
Singh, Virendra, Seal, Sudipta, Coffey, Kevin, Raghavan, Seetha, Heinrich, Helge, Zhai, Lei, University of Central Florida
-
Abstract / Description
-
Cerium oxide (Ceria) at nano scale has gained significant attention due to its numerous technological applications. Ceria in both doped and undoped forms are being explored as oxygen sensor, catalysis, protective coating against UV and corrosion, solid oxide fuel cell (SOFC) electrolyte and newly discovered antioxidant for biomedical applications. Therefore, there is an imminent need of a technology which can provide a cost effective, large scale manufacturing of nanoceria and its subsequent...
Show moreCerium oxide (Ceria) at nano scale has gained significant attention due to its numerous technological applications. Ceria in both doped and undoped forms are being explored as oxygen sensor, catalysis, protective coating against UV and corrosion, solid oxide fuel cell (SOFC) electrolyte and newly discovered antioxidant for biomedical applications. Therefore, there is an imminent need of a technology which can provide a cost effective, large scale manufacturing of nanoceria and its subsequent consolidation, specially using thermal spray.This dissertation aims to develop a scientific understanding towards the development of pure and doped ceria- based coating for a variety of technological applications, from SOFC applications to corrosion resistant coating. Atmospheric plasma spray (APS) and solution precursor plasma spray (SPPS) techniques for the fabrication of nano ceria coating were investigated. For feedstock powder preparation, a spray drying technique was used for the agglomeration of cerium oxide nano particles to achieve high density coating. Deposition efficiencies and coating porosity as a function of processing parameters were analyzed and optimized using a statistical design of experiment model. The coating deposition efficiency was dependent on the plasma temperature and vaporization pressure of the ceria nanoparticles. However, low standoff distance and high carrier gas flow rate were responsible for the improved density upto 86 (&)#177;3%.An alternative novel SPPS technique was studied for a thin film of cerium oxide deposition from various cerium salt precursors in doped and undoped conditions. The SPPS process allows controlling the chemistry of coating at a molecular level. The deposition mechanism by single scan experiments and the effect of various factors on coating microstructure evolution were studied in terms of splats formation. It was found that the precursor salt (nitrate of cerium) with lower thermal decomposition temperatures was suitable for a high density coating. The high concentration and low spray distance significantly improve the splat morphology and reduced porosity (upto 20%). The feasibility of the trivalent cations (Sm 3+ and Gd 3+) doping into cerium oxide lattice in high temperature plasma was discussed and experimentally studied. XRD analysis revealed the nano crystalline characteristic of the coating and lattice expansion due to doping. The extensive transmission electron microscopy, Scanning electron microscopy, X-ray diffraction, X-ray photoelectron spectroscopy and thermo gravimetric were conducted to evaluate the precursors, and coating microstructure.Due to facial switching between Ce4+ and Ce3+ oxidation state, the cerium oxide surface becomes catalytically active. Thus, the APS ceria coatings were investigated for their applicability under extreme environmental conditions (high pressure and temperature). The air plasma sprayed coated 17-4PH steel was subjected to high pressure (10 Kpsi) and temperature (300 oF) corrosive environment. The coated steel showed continuous improvement in the corrosion resistance at 3.5 wt% NaCl at ambient temperature for three months study whereas, high pressure did not reveal a significant role in the corrosion process, and however, one needs to do further research. The ceria coated steel also revealed the improvement in corrosion protection (by 4 times) compared to the bare steel at low pH, 300 oF and 4000 Psi environment. This study projects the importance of cerium oxide coatings, their fabrication, optimization and applications.
Show less
-
Date Issued
-
2012
-
Identifier
-
CFE0004230, ucf:49023
-
Format
-
Document (PDF)
-
PURL
-
http://purl.flvc.org/ucf/fd/CFE0004230
-
-
Title
-
THE EFFECTS OF ELECTRODE GEOMETRY ON CURRENT PULSE CAUSED BY ELECTRICAL DISCHARGE OVER AN ULTRA-FAST LASER FILAMENT.
-
Creator
-
Bubelnik, Matthew, Siders, Craig, University of Central Florida
-
Abstract / Description
-
The time-resolved electrical conductivity of a short-pulse generated plasma filament in air was studied. Close-coupled metal electrodes were used to discharge the stored energy of a high-voltage capacitor and the resulting microsecond-scale electrical discharge was measured using fast current sensors. Significant differences in the time dependence of the current were seen with the two electrode geometries used. Using sharp-tipped electrodes additional peaks in the time-resolved conductivity...
Show moreThe time-resolved electrical conductivity of a short-pulse generated plasma filament in air was studied. Close-coupled metal electrodes were used to discharge the stored energy of a high-voltage capacitor and the resulting microsecond-scale electrical discharge was measured using fast current sensors. Significant differences in the time dependence of the current were seen with the two electrode geometries used. Using sharp-tipped electrodes additional peaks in the time-resolved conductivity were seen, relative to the single peak seen with spherical electrodes. We attribute these additional features to secondary electron collisional ionization brought about by field enhancement at the tips. Additional discrepancies in the currents measured leaving the high-voltage electrode and that returning to ground were also observed. Implications for potential laser-induced discharge applications will be discussed.
Show less
-
Date Issued
-
2005
-
Identifier
-
CFE0000447, ucf:46378
-
Format
-
Document (PDF)
-
PURL
-
http://purl.flvc.org/ucf/fd/CFE0000447
-
-
Title
-
RADIATION STUDIES OF THE TIN-DOPED MICROSCOPIC DROPLET LASER PLASMA LIGHT SOURCE SPECIFIC TO EUV LITHOGRAPHY.
-
Creator
-
Koay, Chiew-Seng, Richardson, Martin, University of Central Florida
-
Abstract / Description
-
Extreme ultraviolet lithography(EUVL) is being developed worldwide as the next generation technology to be inserted in ~ 2009 for the mass production of IC chips with feature sizes
Show moreExtreme ultraviolet lithography(EUVL) is being developed worldwide as the next generation technology to be inserted in ~ 2009 for the mass production of IC chips with feature sizes <35 nm. One major challenge to its implementation is the development of a 13.5 nm EUV source of radiation that meets the requirements of current roadmap designs of the source of illumination in commercial EUVL scanners. The light source must be debris-free, in a free-space environment with the imaging EUV optics that must provide sufficient, narrow spectral band EUV power to print 100 wafers/hr. To meet this need, extensive studies on emission from a laser plasma source utilizing tin-doped droplet target was conducted. Presented in this work, are the many optical techniques such as spectroscopy, radiometry, and imaging, that were employed to characterize and optimize emission from the laser plasma source State of the art EUV spectrographs were employed to observe the source's spectrum under various laser irradiation conditions. Comparing the experimental spectra to those from theory, has allowed the determination of the Sn ion stages responsible for emitting into the useful EUV bandwidth. Experimental results were compared to spectral simulations obtained using Collisional-Radiative Equilibrium (CRE) model, as well. Moreover, extensive measurements surveying source emission from 2 nm to 30 nm, which is the region of the electromagnetic spectrum defined as EUV, was accomplished. Absolutely calibrated metrology was employed with the Flying Circus instrument from which the source's conversion efficiency (CE)--from laser to the useful EUV energy--was characterized under various laser irradiation conditions. Hydrodynamic simulations of the plasma expansion together with the CRE model predicted the condition at which optimum conversion could be attained. The condition was demonstrated experimentally, with the highest CE to be slightly above 2%, which is the highest value among all EUV source contenders. In addition to laser intensity, the CE was found to depend on the laser wavelength. For better understanding, this observation is compared to results from simulations. Through a novel approach in imaging, the size of the plasma was characterized by recording images of the plasma within a narrow band, around 13.5 nm. The size, approximately 100 ìm, is safely within the etendue limit set by the optical elements in the EUV scanner. Finally, the notion of irradiating the target with multiple laser beams was explored for the possibility of improving the source's conversion efficiency.
Show less
-
Date Issued
-
2006
-
Identifier
-
CFE0000938, ucf:46733
-
Format
-
Document (PDF)
-
PURL
-
http://purl.flvc.org/ucf/fd/CFE0000938
-
-
Title
-
LASER PLASMA RADIATION STUDIES FOR DROPLET SOURCES IN THE EXTREME ULTRAVIOLET.
-
Creator
-
Kamtaprasad, Reuvani, Richardson, Martin, University of Central Florida
-
Abstract / Description
-
The advancement of laboratory based Extreme Ultraviolet (EUV) radiation has escalated with the desire to use EUV as a source for semiconductor device printing. Laser plasmas based on a mass-limited target concept, developed within the Laser Plasma Laboratory demonstrate a much needed versatility for satisfying rigorous source requirements. This concept produces minimal debris concerns and allows for the attainment of high repetition rates as well as the accommodation of various laser and...
Show moreThe advancement of laboratory based Extreme Ultraviolet (EUV) radiation has escalated with the desire to use EUV as a source for semiconductor device printing. Laser plasmas based on a mass-limited target concept, developed within the Laser Plasma Laboratory demonstrate a much needed versatility for satisfying rigorous source requirements. This concept produces minimal debris concerns and allows for the attainment of high repetition rates as well as the accommodation of various laser and target configurations. This work demonstrates the generation of EUV radiation by creating laser plasmas from mass-limited targets with indium, tin, and antimony doped droplets. Spectral emission from the laser plasmas is quantified using a flat-field spectrometer. COWAN code oscillator strength predications for each of the dopants were convolved with narrow Gaussian functions creating synthetic spectra for the EUV region between 10 nm - 20 nm. A preliminary comparison was made between the theoretical spectra and experimental results. From this comparison, ion stage transitions for each of the hot dense plasmas generated were assessed.
Show less
-
Date Issued
-
2010
-
Identifier
-
CFE0003168, ucf:48597
-
Format
-
Document (PDF)
-
PURL
-
http://purl.flvc.org/ucf/fd/CFE0003168
-
-
Title
-
LASER INDUCED BREAKDOWN SPECTROSCOPY FOR DETECTION OF ORGANIC RESIDUES: IMPACT OF AMBIENT ATMOSPHERE AND LASER PARAMETERS.
-
Creator
-
Brown, Christopher, Richardson, Martin, University of Central Florida
-
Abstract / Description
-
Laser Induced Breakdown Spectroscopy (LIBS) is showing great potential as an atomic analytical technique. With its ability to rapidly analyze all forms of matter, with little-to-no sample preparation, LIBS has many advantages over conventional atomic emission spectroscopy techniques. With the maturation of the technologies that make LIBS possible, there has been a growing movement to implement LIBS in portable analyzers for field applications. In particular, LIBS has long been considered the...
Show moreLaser Induced Breakdown Spectroscopy (LIBS) is showing great potential as an atomic analytical technique. With its ability to rapidly analyze all forms of matter, with little-to-no sample preparation, LIBS has many advantages over conventional atomic emission spectroscopy techniques. With the maturation of the technologies that make LIBS possible, there has been a growing movement to implement LIBS in portable analyzers for field applications. In particular, LIBS has long been considered the front-runner in the drive for stand-off detection of trace deposits of explosives. Thus there is a need for a better understanding of the relevant processes that are responsible for the LIBS signature and their relationships to the different system parameters that are helping to improve LIBS as a sensing technology. This study explores the use of LIBS as a method to detect random trace amounts of specific organic materials deposited on organic or non-metallic surfaces. This requirement forces the limitation of single-shot signal analysis. This study is both experimental and theoretical, with a sizeable component addressing data analysis using principal components analysis to reduce the dimensionality of the data, and quadratic discriminant analysis to classify the data. In addition, the alternative approach of 'target factor analysis' was employed to improve detection of organic residues on organic substrates. Finally, a new method of characterizing the laser-induced plasma of organics, which should lead to improved data collection and analysis, is introduced. The comparison between modeled and experimental measurements of plasma temperatures and electronic density is discussed in order to improve the present models of low-temperature laser induced plasmas.
Show less
-
Date Issued
-
2011
-
Identifier
-
CFE0003708, ucf:48843
-
Format
-
Document (PDF)
-
PURL
-
http://purl.flvc.org/ucf/fd/CFE0003708
-
-
Title
-
SPECTROSCOPIC STUDIES OF LASER PLASMAS FOR EUV SOURCES.
-
Creator
-
George, Simi, Richardson, Martin, University of Central Florida
-
Abstract / Description
-
With the availability of high reflectivity multilayer mirrors and zone plate lenses, the EUV region (5nm - 40nm) of the electromagnetic spectrum is currently being explored for applications of nanoscale printing and imaging. Advances made in this area have consequences for many areas of science. Research for producing a compact, bright EUV source for laboratory use has gained momentum in recent years. For this study, EUV radiation is produced by irradiating target materials using a focused...
Show moreWith the availability of high reflectivity multilayer mirrors and zone plate lenses, the EUV region (5nm - 40nm) of the electromagnetic spectrum is currently being explored for applications of nanoscale printing and imaging. Advances made in this area have consequences for many areas of science. Research for producing a compact, bright EUV source for laboratory use has gained momentum in recent years. For this study, EUV radiation is produced by irradiating target materials using a focused laser beam. Focused laser beam ionizes the target to create a hot, dense, pulsed plasma source, where emission is a result of the relaxation of excited levels. Spectroscopy is used as the main diagnostic to obtain the spectral signature of the plasma. Spectral characteristics are used to deduce the physical state of plasma, thus enabling the tuning of laser irradiance conditions to maximize the needed emission bandwidth. Various target materials are studied, as well as different target geometries, with spectroscopy below 200 nm on pulsed micro-plasmas being a particularly daunting task. Total range spectroscopy from 1 nm to greater than 1 micron is completed for tin-doped spherical droplet plasma source. Reliable plasma diagnostics require both accurate measurements and solid theoretical support in order to interpret the experimental results. Using existing 1D-hydrocode, temperature and density characteristics of the expanding plasma is simulated for any set of experimental conditions. Existing atomic codes written for calculating one-electron radial wavefunctions with LS-coupling scheme via Hartree-Fock method is used in order to gain details of the ion stages, populations, transitions, etc, contributing to the spectral data.
Show less
-
Date Issued
-
2007
-
Identifier
-
CFE0001972, ucf:47433
-
Format
-
Document (PDF)
-
PURL
-
http://purl.flvc.org/ucf/fd/CFE0001972
-
-
Title
-
DEVELOPMENT OF THERMALLY PROCESSED NANOCOMPOSITES WITH CONTROLLED SURFACES.
-
Creator
-
Georgieva, Petya, Seal, Sudipta, University of Central Florida
-
Abstract / Description
-
The ever increasing need for technology development requires the integration of inexpensive, light weight and high strength materials which are able to meet the high standards and specifications for various engineering applications. The intention of this work is to show that the suitable material selection and the utilization of plasma spray processing can be of potential interest to a large number of industrial, biomedical and everyday life applications. This research demonstrates also that...
Show moreThe ever increasing need for technology development requires the integration of inexpensive, light weight and high strength materials which are able to meet the high standards and specifications for various engineering applications. The intention of this work is to show that the suitable material selection and the utilization of plasma spray processing can be of potential interest to a large number of industrial, biomedical and everyday life applications. This research demonstrates also that plasma processing is a promising engineering tool for multifunctional coatings and near-net-shape manufacturing. Further, the theoretical and experimental results are combined in order to explain the mechanisms behind nanostructure retention and enhanced properties. Proper design of experiments, an appropriate material selection and experimental methodology are discussed herein. The experimental conditions were optimized in order to achieve the best materials properties according to their explicit properties and functions. Specific materials were consolidated according to their prospective performance and applications: 1) Plasma spraying of nano-Ceria-stabilized Zirconia free form part for stem cells scaffolds, 2) Plasma spraying of FeCrAlY on Ti-alloy plate, additionally coated with nano-size Hydroxyapatite for bone tissue engineering, 3) Wire-arc spraying of nano-based steel wires for aerospace and automotive applications. The performance and characteristics of all of the developed coatings and free-form-parts are evaluated using state-of-the art characterization techniques.
Show less
-
Date Issued
-
2006
-
Identifier
-
CFE0001153, ucf:46871
-
Format
-
Document (PDF)
-
PURL
-
http://purl.flvc.org/ucf/fd/CFE0001153
-
-
Title
-
THE EFFECT OF K562-IL21-2 PLASMA MEMBRANE PARTICLES ON THE PROLIFERATION OF NATURAL KILLER CELLS TO FIGHT CANCER.
-
Creator
-
Prophete, Michelle, Copik, Alicja, University of Central Florida
-
Abstract / Description
-
Immunotherapy has emerged as a current and future paradigm of cancer treatment, which utilizes the body's immune system to eradicate cancer. Natural Killer (NK) cells as part of the innate immune system have immense potential in their anti-tumor cytotoxic activities and host cell surveillance properties. NK cells comprise approximately five to fifteen percent of peripheral blood lymphocytes and can be proliferated in vitro using recently developed methods with co-cultures with feeder cells ...
Show moreImmunotherapy has emerged as a current and future paradigm of cancer treatment, which utilizes the body's immune system to eradicate cancer. Natural Killer (NK) cells as part of the innate immune system have immense potential in their anti-tumor cytotoxic activities and host cell surveillance properties. NK cells comprise approximately five to fifteen percent of peripheral blood lymphocytes and can be proliferated in vitro using recently developed methods with co-cultures with feeder cells (derived from engineered tumor cells) or plasma membrane (PM) particles, produced from the fore mentioned feeder cells, in combination with soluble cytokines. For efficient growth and maintenance of these NK cells, Interleukin-2 (IL-2) is utilized. IL-2 in solution, through receptor mediated signaling, stimulates proliferation of T-cells and NK cells. NK cells have lower responsiveness to IL-2 and consequently require a larger systemic dose to stimulate them as opposed to competing cell populations that have higher expression of receptors for IL-2, such as T-cells, which can have the effect of lower effective stimulation of NK cell growth. Such difference in the stimulatory capability of IL-2 toward NK cells and the short circulation lifetime of soluble IL-2 require higher dosages of soluble IL-2 for effective in vivo NK cell proliferation for therapeutic application against cancer, but is toxic. Therefore establishing another form of IL-2 delivery that improves its specific targeting to NK cells would be beneficial and may be crucial for novel therapeutic improvement. The Copik Laboratory has made an IL-2 fusion protein construct having a membrane anchor for expression of membrane-bound IL-2 on K562-41bbl-21 cells (K562-IL21). K562-IL21 cells are selectively recognized by NK cells and stimulate their proliferation and cytotoxicity. Hence, a K562-IL21 membrane-bound IL-2 form should be targeted to NK cells with IL-2 delivery. K562-IL21-2 cells were then used to prepare PM21-2 particles which have the potential to provide NK cell targeted, long-lived form of IL-2 for use as an injectable drug for in vivo adjuvant stimulation of NK cells. The presence of IL-2 on the in the PM21-2 particle product was verified by Western blot, and ELISA. Particle preparations from the modified K562 cells should possess characteristics that allow them to possibly replace soluble IL-2 and more specifically increase the numbers or anti-tumor activity of NK cell populations. The effect of PM21-2 particles was studied in in vitro culture based experiments, which tested the effectiveness the PM21-2 particles to induce selective NK cells expansion as compared to PM21 particles in the presence or absence of soluble IL-2.
Show less
-
Date Issued
-
2017
-
Identifier
-
CFH2000353, ucf:45918
-
Format
-
Document (PDF)
-
PURL
-
http://purl.flvc.org/ucf/fd/CFH2000353
-
-
Title
-
EFFECTS OF INTERNAL OXIDATION ON THERMO-MECHANICAL PROPERTIES OF ATMOSPHERIC PLASMA SPRAYED CONICRALY COATINGS.
-
Creator
-
Patterson, Travis, Sohn, Yong-ho, University of Central Florida
-
Abstract / Description
-
Thermal barrier coatings (TBC) with MCrAlY (M=Co and/or Ni) bond coats have been widely used in hot sections of gas turbines to protect underlying superalloys from high temperatures, oxidation, and hot corrosion. Deposition of MCrAlY bond coats using atmospheric plasma spray (APS), as oppose to conventionally employed vacuum/low-pressure plasma spray and high velocity oxy-fuel deposition, allows greater flexibility in ability to coat economically and rapidly for parts with complex geometry...
Show moreThermal barrier coatings (TBC) with MCrAlY (M=Co and/or Ni) bond coats have been widely used in hot sections of gas turbines to protect underlying superalloys from high temperatures, oxidation, and hot corrosion. Deposition of MCrAlY bond coats using atmospheric plasma spray (APS), as oppose to conventionally employed vacuum/low-pressure plasma spray and high velocity oxy-fuel deposition, allows greater flexibility in ability to coat economically and rapidly for parts with complex geometry including internal surfaces. There were three objectives of this study. First, relationships between APS spray parameters and coating microstructure was examined to determine optimum spray parameters to deposit APS CoNiCrAlY bond coats. Second, free-standing APS CoNiCrAlY coatings were isothermally oxidized at 1124C for various periods to examine the evolving microstructure of internal oxidation. Third, as a function of time of isothermal oxidation (i.e., internal oxidation), thermal conductivity and coefficient of thermal expansion were measured for free-standing APS CoNiCrAlY bond coats. Thirteen CoNiCrAlY coatings were deposited on steel substrates by APS using the F4-MB plasma torch. APS CoNiCrAlY bond coats were produced by incremental variation in the flow rate of primary (argon) gas from 85 to 165 SCFH and the flow rate of secondary (hydrogen) gas from 9 to 29 SCFH. Optimum coating microstructure was produced by simultaneously increasing the flow rate of both primary and secondary gas, so that the particle temperature is high enough for sufficient melting and the particle velocity is rapid enough for minimum in-flight oxidation. Optimum spray parameters found in this study were employed to deposit free-standing APS CoNiCrAlY coatings that were isothermally oxidized at 1124ºC for 1, 6, 50,100, and 300 hours. Extent of internal oxidation was examined by scanning electron microscopy and image analysis. Internal oxidation occurred by a thickening of oxide scales segregated at the splat boundaries oriented parallel to the coating surfaces. Thermal conductivity and coefficient of thermal expansion (CTE) of the free-standing APS CoNiCrAlY coatings were measured as a function of internal oxidation (i.e., time of oxidation or extent of internal oxidation). Thermal conductivity of free-standing APS CoNiCrAlY was found to decrease with increasing internal oxidation from 28 to 25 W/m-K. This decrease is due to an increase in the amount of internal oxides with lower thermal conductivity (e.g., Al2O3). CTE of free-standing APS CoNiCrAlY, measured in temperature range of 100~500C, was also found to decrease with increasing internal oxidation. Internal oxides have lower CTE than metallic CoNiCrAlY coatings. These evolving properties of APS CoNiCrAlY should be beneficial to the overall performance of TBCs in gas turbine applications.
Show less
-
Date Issued
-
2008
-
Identifier
-
CFE0002400, ucf:47757
-
Format
-
Document (PDF)
-
PURL
-
http://purl.flvc.org/ucf/fd/CFE0002400
-
-
Title
-
Fatigue Lifetime Approximation based on Quantitative Microstructural Analysis for Air Plasma Sprayed Thermal Barrier Coatings.
-
Creator
-
Bargraser, Carmen, Sohn, Yongho, An, Linan, Heinrich, Helge, University of Central Florida
-
Abstract / Description
-
The durability of thermal barrier coatings (TBCs) affects the life of the hot section engine components on which they are applied. Fatigue is the general failure mechanism for such components and is responsible for most unexpected failures; therefore it is desirable to develop lifetime approximation models to ensure reliability and durability.In this study, we first examined the microstructural degradation of air plasma sprayed ZrO2-8wt.%Y2O3 TBCs with a low-pressure plasma sprayed CoNiCrAlY...
Show moreThe durability of thermal barrier coatings (TBCs) affects the life of the hot section engine components on which they are applied. Fatigue is the general failure mechanism for such components and is responsible for most unexpected failures; therefore it is desirable to develop lifetime approximation models to ensure reliability and durability.In this study, we first examined the microstructural degradation of air plasma sprayed ZrO2-8wt.%Y2O3 TBCs with a low-pressure plasma sprayed CoNiCrAlY bond coat on an IN 738LC superalloy substrate. The durability of TBCs were assessed through furnace thermal cyclic tests carried out in air at 1100(&)deg;C with a 1-, 10-, and 50-hour dwell period, preceded by a 10-minute heat-up and followed by a 10-minute forced-air-quench. Failure mechanisms of the TBCs were thoroughly investigated through materials characterization techniques including: X-Ray Diffraction, Scanning Electron Microscopy, and Energy Dispersive X-Ray Spectroscopy.Quantitative microstructural analyses were then carried out to document the growth of the thermally grown oxide (TGO) scale, the depletion of the Al-rich ?-NiAl phase in the bond coat, and the population and growth of micro-cracks near the YSZ/bond coat interface. Trends in the TGO growth and the ?-phase depletion in the bond coat followed those of diffusion-controlled processes(-)parabolic growth of the TGO and exponential depletion of the ?-phase. Formation and propagation of cracks within the YSZ resulted in complete spallation of the YSZ topcoat from the bond-coated superalloy substrate.Evolution in these microstructural features was correlated to the lifetime of TBCs, which showed cracking within the YSZ to be the cause of failure; thus a lifetime approximation model was developed, via modification of Paris Law, based on the experimental data. The model predicted the TBC lifetime within 10% of the experimental lifetime.
Show less
-
Date Issued
-
2011
-
Identifier
-
CFE0004087, ucf:49145
-
Format
-
Document (PDF)
-
PURL
-
http://purl.flvc.org/ucf/fd/CFE0004087
-
-
Title
-
EXTREME ULTRAVIOLET SPECTRAL STREAK CAMERA.
-
Creator
-
Szilagyi, John, Richardson, Martin, University of Central Florida
-
Abstract / Description
-
The recent development of extreme ultraviolet (EUV) sources has increased the need for diagnostic tools, and has opened up a previously limited portion of the spectrum. With ultrafast laser systems and spectroscopy moving into shorter timescales and wavelengths, the need for nanosecond scale imaging of EUV is increasing. EUVÃÂÃÂÃÂÃÂ's high absorption has limited the number of imaging options due...
Show moreThe recent development of extreme ultraviolet (EUV) sources has increased the need for diagnostic tools, and has opened up a previously limited portion of the spectrum. With ultrafast laser systems and spectroscopy moving into shorter timescales and wavelengths, the need for nanosecond scale imaging of EUV is increasing. EUVÃÂÃÂÃÂÃÂ's high absorption has limited the number of imaging options due to the many atomic resonances in this spectrum. Currently EUV is imaged with photodiodes and X-ray CCDs. However photodiodes are limited in that they can only resolve intensity with respect to time and X-ray CCDs are limited to temporal resolution in the microsecond range. This work shows a novel approach to imaging EUV light over a nanosecond time scale, by using an EUV scintillator to convert EUV to visible light imaged by a conventional streak camera. A laser produced plasma, using a mass-limited tin based target, provided EUV light which was imaged by a grazing incidence flat field spectrometer onto a Ce:YAG scintillator. The EUV spectrum (5 nm-20 nm) provided by the spectrometer is filter by a zirconium filter and then converted by the scintillator to visible light (550 nm) which can then be imaged with conventional optics. Visible light was imaged by an electron image tube based streak camera. The streak camera converts the visible light image to an electron image using a photocathode, and sweeps the image across a recording medium. The streak camera also provides amplification and gating of the image by the means of a micro channel plate, within the image tube, to compensate for low EUV intensities. The system provides 42 ns streaked images of light with a temporal resolution of 440 ps at a repetition rate of 1 Hz. Upon calibration the EUV streak camera developed in this work will be used in future EUV development.
Show less
-
Date Issued
-
2010
-
Identifier
-
CFE0003558, ucf:48905
-
Format
-
Document (PDF)
-
PURL
-
http://purl.flvc.org/ucf/fd/CFE0003558
Pages