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LASER PLASMA RADIATION STUDIES FOR DROPLET SOURCES IN THE EXTREME ULTRAVIOLET
Title
LASER PLASMA RADIATION STUDIES FOR DROPLET SOURCES IN THE EXTREME ULTRAVIOLET.
Creator
Kamtaprasad, Reuvani, Richardson, Martin, University of Central Florida
Abstract / Description
The advancement of laboratory based Extreme Ultraviolet (EUV) radiation has escalated with the desire to use EUV as a source for semiconductor device printing. Laser plasmas based on a mass-limited target concept, developed within the Laser Plasma Laboratory demonstrate a much needed versatility for satisfying rigorous source requirements. This concept produces minimal debris concerns and allows for the attainment of high repetition rates as well as the accommodation of various laser and...
Show moreThe advancement of laboratory based Extreme Ultraviolet (EUV) radiation has escalated with the desire to use EUV as a source for semiconductor device printing. Laser plasmas based on a mass-limited target concept, developed within the Laser Plasma Laboratory demonstrate a much needed versatility for satisfying rigorous source requirements. This concept produces minimal debris concerns and allows for the attainment of high repetition rates as well as the accommodation of various laser and target configurations. This work demonstrates the generation of EUV radiation by creating laser plasmas from mass-limited targets with indium, tin, and antimony doped droplets. Spectral emission from the laser plasmas is quantified using a flat-field spectrometer. COWAN code oscillator strength predications for each of the dopants were convolved with narrow Gaussian functions creating synthetic spectra for the EUV region between 10 nm - 20 nm. A preliminary comparison was made between the theoretical spectra and experimental results. From this comparison, ion stage transitions for each of the hot dense plasmas generated were assessed.
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Date Issued
2010
Identifier
CFE0003168, ucf:48597
Format
Document (PDF)
PURL
http://purl.flvc.org/ucf/fd/CFE0003168
EXTREME ULTRAVIOLET SPECTRAL STREAK CAMERA
Title
EXTREME ULTRAVIOLET SPECTRAL STREAK CAMERA.
Creator
Szilagyi, John, Richardson, Martin, University of Central Florida
Abstract / Description
The recent development of extreme ultraviolet (EUV) sources has increased the need for diagnostic tools, and has opened up a previously limited portion of the spectrum. With ultrafast laser systems and spectroscopy moving into shorter timescales and wavelengths, the need for nanosecond scale imaging of EUV is increasing. EUVÂÂÂÂ's high absorption has limited the number of imaging options due...
Show moreThe recent development of extreme ultraviolet (EUV) sources has increased the need for diagnostic tools, and has opened up a previously limited portion of the spectrum. With ultrafast laser systems and spectroscopy moving into shorter timescales and wavelengths, the need for nanosecond scale imaging of EUV is increasing. EUVÂÂÂÂ's high absorption has limited the number of imaging options due to the many atomic resonances in this spectrum. Currently EUV is imaged with photodiodes and X-ray CCDs. However photodiodes are limited in that they can only resolve intensity with respect to time and X-ray CCDs are limited to temporal resolution in the microsecond range. This work shows a novel approach to imaging EUV light over a nanosecond time scale, by using an EUV scintillator to convert EUV to visible light imaged by a conventional streak camera. A laser produced plasma, using a mass-limited tin based target, provided EUV light which was imaged by a grazing incidence flat field spectrometer onto a Ce:YAG scintillator. The EUV spectrum (5 nm-20 nm) provided by the spectrometer is filter by a zirconium filter and then converted by the scintillator to visible light (550 nm) which can then be imaged with conventional optics. Visible light was imaged by an electron image tube based streak camera. The streak camera converts the visible light image to an electron image using a photocathode, and sweeps the image across a recording medium. The streak camera also provides amplification and gating of the image by the means of a micro channel plate, within the image tube, to compensate for low EUV intensities. The system provides 42 ns streaked images of light with a temporal resolution of 440 ps at a repetition rate of 1 Hz. Upon calibration the EUV streak camera developed in this work will be used in future EUV development.
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Date Issued
2010
Identifier
CFE0003558, ucf:48905
Format
Document (PDF)
PURL
http://purl.flvc.org/ucf/fd/CFE0003558
INTERNATIONAL SPACE STATION REMOTE SENSING POINTING ANALYSIS
Title
INTERNATIONAL SPACE STATION REMOTE SENSING POINTING ANALYSIS.
Creator
Jacobson, Craig, Leonessa, Alexander, University of Central Florida
Abstract / Description
This paper analyzes the geometric and disturbance aspects of utilizing the International Space Station for remote sensing of earth targets. The proposed instrument is SHORE (Station High-Sensitivity Ocean Research Experiment), a multi-band optical spectrometer with 15 m pixel resolution. The analysis investigates the contribution of the error effects to the quality of data collected by the instrument. The analysis begins with the discussion of the coordinate systems involved and then...
Show moreThis paper analyzes the geometric and disturbance aspects of utilizing the International Space Station for remote sensing of earth targets. The proposed instrument is SHORE (Station High-Sensitivity Ocean Research Experiment), a multi-band optical spectrometer with 15 m pixel resolution. The analysis investigates the contribution of the error effects to the quality of data collected by the instrument. The analysis begins with the discussion of the coordinate systems involved and then conversion from the target coordinate system to the instrument coordinate system. Next the geometry of remote observations from the Space Station is investigated including the effects of the instrument location in Space Station and the effects of the line of sight to the target. The disturbance and error environment on Space Station is discussed covering factors contributing to drift and jitter, accuracy of pointing data and target and instrument accuracies. Finally, there is a brief discussion of image processing to address any post error correction options.
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Date Issued
2005
Identifier
CFE0000855, ucf:46661
Format
Document (PDF)
PURL
http://purl.flvc.org/ucf/fd/CFE0000855
Design, Development, and Testing of a Miniature Fixture for Uniaxial Compression of Ceramics Coupled with In-Situ Raman Spectrometer
Title
Design, Development, and Testing of a Miniature Fixture for Uniaxial Compression of Ceramics Coupled with In-Situ Raman Spectrometer.
Creator
Jordan, Ryan, Orlovskaya, Nina, Kwok, Kawai, Ghosh, Ranajay, University of Central Florida
Abstract / Description
This thesis is about the design, development and integration of an in-situ compression stage which interfaces through the Leica optical microscope coupled with a Renishaw InVia micro-Raman spectrometer. This combined compression stage and Raman system will enable structural characterization of ceramics and ceramic composites. The in-situ compression stage incorporates a 440C stainless steel structural components, 6061 aluminum frame, a NEMA 23 stepper motor. Two load screws that allow to...
Show moreThis thesis is about the design, development and integration of an in-situ compression stage which interfaces through the Leica optical microscope coupled with a Renishaw InVia micro-Raman spectrometer. This combined compression stage and Raman system will enable structural characterization of ceramics and ceramic composites. The in-situ compression stage incorporates a 440C stainless steel structural components, 6061 aluminum frame, a NEMA 23 stepper motor. Two load screws that allow to apply compressive loads up to 14,137 N, with negligible off axis loading, achieving target stresses of 500 MPa for samples of up to 6.00 mm in diameter. The system will be used in the future to study the structural changes in ceramics and ceramic composites, as well as to study thermal residual stress redistribution under applied compressive loads. A broad variety of Raman active ceramics, including the traditional structural ceramics 3mol%Y2O3-ZrO2, B4C, SiC, Si3N4, as well as exotic materials such as LaCoO3 and other perovskites will be studied using this system. Calibration of the systems load cell was performed in the configured state using MTS universal testing machines. To ensure residual stresses from mounting the load cell did not invalidate the original calibration, the in-situ compression stage was tested once attached to the Renishaw Raman spectrometer using LaCoO3 ceramic samples. The Raman shift of certain peaks in LaCoO3 was detected indicative of the effect of the applied compressive stress on the ceramics understudy.
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Date Issued
2019
Identifier
CFE0007824, ucf:52809
Format
Document (PDF)
PURL
http://purl.flvc.org/ucf/fd/CFE0007824