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MICRO-OPTIC-SPECTRAL-SPATIAL-ELEMENTS (MOSSE)
Title
MICRO-OPTIC-SPECTRAL-SPATIAL-ELEMENTS (MOSSE).
Creator
Mehta, Alok, Johnson, Eric, University of Central Florida
Abstract / Description
Over a wide range of applications, optical systems have utilized conventional optics in order to provide the ability to engineer the properties of incident infra-red fields in terms of the transmitted field spectral, spatial, amplitude, phase, and polarization characteristics. These micro/nano-optical elements that provide specific optical functionality can be categorized into subcategories of refractive, diffractive, multi-layer thin film dichroics, 3-D photonic crystals, and polarization...
Show moreOver a wide range of applications, optical systems have utilized conventional optics in order to provide the ability to engineer the properties of incident infra-red fields in terms of the transmitted field spectral, spatial, amplitude, phase, and polarization characteristics. These micro/nano-optical elements that provide specific optical functionality can be categorized into subcategories of refractive, diffractive, multi-layer thin film dichroics, 3-D photonic crystals, and polarization gratings. The feasibility of fabrication, functionality, and level of integration which these elements can be used in an optical system differentiate which elements are more compatible with certain systems than others. With enabling technologies emerging allowing for a wider range of options when it comes to lithographic nano/micro-patterning, dielectric growth, and transfer etching capabilities, optical elements that combine functionalities of conventional optical elements can be realized. Within this one class of optical elements, it is possible to design and fabricate components capable of tailoring the spectral, spatial, amplitude, phase, and polarization characteristics of desired fields at different locations within an optical system. Optical transmission filters, polarization converting elements, and spectrally selective reflecting components have been investigated over the course of this dissertation and have been coined  MOSSE,' which is an acronym for micro-optic-spectral-spatial-elements. Each component is developed and fabricated on a wafer scale where the thin film deposition, lithographic exposure, and transfer etching stages are decoupled from each other and performed in a sequential format. This facilitates the ability to spatially vary the optical characteristics of the different MOSSE structures across the surface of the wafer itself.
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Date Issued
2007
Identifier
CFE0001962, ucf:47457
Format
Document (PDF)
PURL
http://purl.flvc.org/ucf/fd/CFE0001962
FEMTOSECOND LASER WRITTEN VOLUMETRIC DIFFRACTIVE OPTICAL ELEMENTS AND THEIR APPLICATIONS
Title
FEMTOSECOND LASER WRITTEN VOLUMETRIC DIFFRACTIVE OPTICAL ELEMENTS AND THEIR APPLICATIONS.
Creator
Choi, Jiyeon, Richardson, Martin, University of Central Florida
Abstract / Description
Since the first demonstration of femtosecond laser written waveguides in 1996, femtosecond laser direct writing (FLDW) has been providing a versatile means to fabricate embedded 3-D microstructures in transparent materials. The key mechanisms are nonlinear absorption processes that occur when a laser beam is tightly focused into a material and the intensity of the focused beam reaches the range creating enough free electrons to induce structural modification. One of the most useful features...
Show moreSince the first demonstration of femtosecond laser written waveguides in 1996, femtosecond laser direct writing (FLDW) has been providing a versatile means to fabricate embedded 3-D microstructures in transparent materials. The key mechanisms are nonlinear absorption processes that occur when a laser beam is tightly focused into a material and the intensity of the focused beam reaches the range creating enough free electrons to induce structural modification. One of the most useful features that can be exploited in fabricating photonic structures is the refractive index change which results from the localized energy deposition. The laser processing system for FLDW can be realized as a compact, desktop station, implemented by a laser source, a 3-D stage and focusing optics. Thus, FLDW can be readily adopted for the fabrication of the photonic devices. For instance, it has been widely employed in various areas of photonic device fabrication such as active and passive waveguides, couplers, gratings, opto-fluidics and similar applications. This dissertation describes the use of FLDW towards the fabrication of custom designed diffractive optical elements (DOE's). These are important micro-optical elements that are building blocks in integrated optical devices including on-chip sensors and systems. The fabrication and characterization of laser direct written DOEs in different glass materials is investigated. The design and performance of a range of DOE's is described, especially, laser-written embedded Fresnel zone plates and linear gratings. Their diffractive efficiency as a function of the fabrication parameters is discussed and an optimized fabrication process is realized. The potential of the micro-DOEs and their integration shown in this dissertation will impact on the fabrication of future on-chip devices involving customized DOEs that will serve great flexibility and multi-functional capability on sensing, imaging and beam shaping.
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Date Issued
2009
Identifier
CFE0002958, ucf:47984
Format
Document (PDF)
PURL
http://purl.flvc.org/ucf/fd/CFE0002958
DESIGN, ANALYSIS, AND OPTIMIZATION OF DIFFRACTIVE OPTICAL ELEMENTS UNDER HIGH NUMERICAL APERTURE FOCUSING
Title
DESIGN, ANALYSIS, AND OPTIMIZATION OF DIFFRACTIVE OPTICAL ELEMENTS UNDER HIGH NUMERICAL APERTURE FOCUSING.
Creator
Jabbour, Toufic, Kuebler, Stephen, University of Central Florida
Abstract / Description
The demand for high optical resolution has brought researchers to explore the use of beam shaping diffractive optical elements (DOEs) for improving performance of high numerical aperture (NA) optical systems. DOEs can be designed to modulate the amplitude, phase and/or polarization of a laser beam such that it focuses into a targeted irradiance distribution, or point spread function (PSF). The focused PSF can be reshaped in both the transverse focal plane and along the optical axis. Optical...
Show moreThe demand for high optical resolution has brought researchers to explore the use of beam shaping diffractive optical elements (DOEs) for improving performance of high numerical aperture (NA) optical systems. DOEs can be designed to modulate the amplitude, phase and/or polarization of a laser beam such that it focuses into a targeted irradiance distribution, or point spread function (PSF). The focused PSF can be reshaped in both the transverse focal plane and along the optical axis. Optical lithography, microscopy and direct laser writing are but a few of the many applications in which a properly designed DOE can significantly improve optical performance of the system. Designing DOEs for use in high-NA applications is complicated by electric field depolarization that occurs with tight focusing. The linear polarization of off-axis rays is tilted upon refraction towards the focal point, generating additional transverse and longitudinal polarization components. These additional field components contribute significantly to the shape of the PSF under tight focusing and cannot be neglected as in scalar diffraction theory. The PSF can be modeled more rigorously using the electromagnetic diffraction integrals derived by Wolf, which account for the full vector character of the field. In this work, optimization algorithms based on vector diffraction theory were developed for designing DOEs that reshape the PSF of a 1.4-NA objective lens. The optimization techniques include simple exhaustive search, iterative optimization (Method of Generalized Projections), and evolutionary computation (Particle Swarm Optimization). DOE designs were obtained that can reshape either the transverse PSF or the irradiance distribution along the optical axis. In one example of transverse beam shaping, all polarization components were simultaneously reshaped so their vector addition generates a focused flat-top square irradiance pattern. Other designs were obtained that can be used to narrow the axial irradiance distribution, giving a focused beam that is superresolved relative to the diffraction limit. In addition to theory, experimental studies were undertaken that include (1) fabricating an axially superresolving DOE, (2) incorporating the DOE into the optical setup, (3) imaging the focused PSF, and (4) measuring aberrations in the objective lens to study how these affect performance of the DOE.
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Date Issued
2009
Identifier
CFE0002844, ucf:48063
Format
Document (PDF)
PURL
http://purl.flvc.org/ucf/fd/CFE0002844
ADDITIVE LITHOGRAPHY FABRICATION AND INTEGRATION OF MICRO OPTICS
Title
ADDITIVE LITHOGRAPHY FABRICATION AND INTEGRATION OF MICRO OPTICS.
Creator
Pitchumani, Mahesh, Johnson, Eric, University of Central Florida
Abstract / Description
Optical elements are the fundamental components in photonic systems and are used to transform an input optical beam into a desired beam profile or to couple the input beam into waveguides, fibers, or other optical systems or devices. Macroscopic optical elements are easily fabricated using grinding and polishing techniques, but few methods exist for inexpensive fabrication of micro optical elements. In this work we present an innovative technique termed Additive Lithography that makes use of...
Show moreOptical elements are the fundamental components in photonic systems and are used to transform an input optical beam into a desired beam profile or to couple the input beam into waveguides, fibers, or other optical systems or devices. Macroscopic optical elements are easily fabricated using grinding and polishing techniques, but few methods exist for inexpensive fabrication of micro optical elements. In this work we present an innovative technique termed Additive Lithography that makes use of binary masks and controlled partial exposures to sculpt photoresist into the desired optical surface relief profile. We explore various masking schemes for fabricating a variety of optical elements with unprecedented flexibility and precision. These masking schemes used in conjunction with the additive lithographic method allows us to carefully control the photoresist exposure and reflow processes for fabricating complex aspheric lens elements, including aspheric elements whose fabrication often proves highly problematic. It will be demonstrated that employing additive lithography for volume sculpting followed by controlled reflow can also allow us to fabricate refractive beam shaping elements. Finally we will discuss the dry etching techniques used to transfer these optical elements into the glass substrate. Thus the additive lithography technique will be demonstrated as an inexpensive, high throughput and efficient process in the fabrication of micro optical elements.
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Date Issued
2006
Identifier
CFE0000914, ucf:46761
Format
Document (PDF)
PURL
http://purl.flvc.org/ucf/fd/CFE0000914